A GaN Power Integration Platform Based on Engineered Bulk Si Substrate with Eliminated Crosstalk Between High-Side and Low-Side HEMTs

Gang Lyu,Jin Wei,Wenjie Song,Zheyang Zheng,Li Zhang,Jie Zhang,Yan Cheng,Sirui Feng,Yat Hon Ng,Tao Chen,Kailun Zhong,Jiapeng Liu,Rong Zeng,Kevin J. Chen
DOI: https://doi.org/10.1109/iedm19574.2021.9720505
2021-01-01
Abstract:A novel GaN power IC platform on engineered bulk Si (EBUS) substrate is demonstrated for monolithic integration of 200-V high-side and low-side p-GaN HEMTs of a half-bridge circuit. The engineered substrate features a P+-N-doping profile realized by P-type implantation into an N-type (111) Si wafer. The P+ Si layer is then split into P+ islands using deep trenches and are effectively isolated through back-to-back PN junctions. The P+ island provides a local electrical substrate for the overlaying GaN HEMT, while all GaN HEMTs share the same bulk Si wafer; such configuration enables monolithic GaN power integration with eliminated crosstalk associated with conventional bulk Si that serves as a common electrical substrate.
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