Controllable removal of silicon carbide at nano scale by ion-implantation assisted laser machining

Jinshi Wang,Fengzhou Fang
DOI: https://doi.org/10.1016/j.cirp.2023.03.008
IF: 4.482
2023-04-01
CIRP Annals
Abstract:Laser machining has achieved successes in fabricating micro/nano-structures on polymers. For brittle materials having no photopolymerization effect, it is extremely difficult to obtain nanometric surface finish. A novel method is proposed to reduce the electronic band gap by ion implantation in this study. A specific laser wavelength is selected so that only the electrons in the implanted zones are excited by one photon while others by multi-photon. As a result, ablation threshold is lowered and selective material removal is successfully achieved. Experimental results show the proposed approach can reduce the surface roughness to one-sixth of that by traditional laser machining.
engineering, manufacturing, industrial
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