Post-annealing optimization of the heteroepitaxial La-doped SrSnO 3 integrated on silicon via ALD

Yu Zhang,Shen Hu,Pei-Yu Chen,Jiyuan Zhu,Bojia Chen,Rongxu Bai,Hao Zhu,Lin Chen,David W Zhang,Jack C Lee,Qingqing Sun,John G Ekerdt,Li Ji,David W. Zhang,Jack C. Lee,John G. Ekerdt
DOI: https://doi.org/10.1039/d2nr06861c
IF: 6.7
2023-01-01
Nanoscale
Abstract:This study demonstrated the successful epitaxy of La-SrSnO 3 /BaTiO 3 on SrTiO 3 -buffered Si (001) with ALD-deposited La-SrSnO 3 and explored the optimization of post-annealing to enhance the capacitance properties of heterostructure.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
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