Interfacial charge and strain effects on lanthanum doped barium stannate thin film under ferroelectric gating

Jiameng Cui,Jianlin Wang,Haoliang Huang,Zhibo Zhao,Yuanjun Yang,Yuanxi Zhang,Zhengping Fu,Yalin Lu
DOI: https://doi.org/10.1063/5.0006999
IF: 4
2020-07-06
Applied Physics Letters
Abstract:Interfacial charge and strain are two coupling effects in semiconductor/ferroelectric epitaxial heterostructures, which are pivotal for use in tailoring functionalities in devices. In this work, La<sub>0.04</sub>Ba<sub>0.96</sub>SnO<sub>3</sub>/0.7Pb(Mg<sub>1/3</sub>Nb<sub>2/3</sub>)O<sub>3</sub>–0.3PbTiO<sub>3</sub> heterostructures with varying film thicknesses were prepared in order to understand both charge and strain's contributions to the electric-field induced resistance change. The relative resistance change to the lattice strain remains almost unchanged in those thicker films, while increases a little bit in those thinner films. This slight increase is related to the substrate constraint near the interface and follows Freund's strain relaxation model during the dynamic strain induced by the piezoelectric switch. A depletion layer model was also established to simulate the electroresistance variation from the interfacial charge effect. The depletion layer involves an equilibrium between capture and release of electrons by the acceptor-like defects near the interface region. The resistance change vs electric field evolves from a butterfly-like shape to a square-like when decreasing the film thickness, due to the joint effect of strain and interfacial polarization screening charge. This study provides an insight into understanding heteroepitaxial coupling and exploring their potential applications in oxide electronic devices.
physics, applied
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