A comprehensive analytical model for threshold voltage calculation in GaN based metal-oxide-semiconductor high-electron-mobility transistors

M. Ťapajna,J. Kuzmík
DOI: https://doi.org/10.1063/1.3694768
IF: 4
2012-03-12
Applied Physics Letters
Abstract:An analytical model for threshold voltage calculation for metal-oxide-semiconductor GaN based high electron mobility transistors is proposed. This model includes polarization induced charges at each heterostructure interface/surface, surface donors, oxide/barrier interface traps charge, and interfacial and bulk fixed oxide charge. Applicability of the model is demonstrated on GaN/AlGaN/GaN MOS heterostructure capacitors with Al2O3 and HfO2 gate dielectrics grown by atomic layer deposition with different barrier surface treatment and Al2O3 thicknesse.
physics, applied
What problem does this paper attempt to address?