Reconfigurable phase-change photomask for grayscale photolithography

Q. Wang,G. H. Yuan,K. S. Kiang,K. Sun,B. Gholipour,E. T. F. Rogers,K. Huang,S. S. Ang,N. I. Zheludev,J. H. Teng
DOI: https://doi.org/10.1063/1.4983198
IF: 4
2017-05-15
Applied Physics Letters
Abstract:We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.
physics, applied
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