Grayscale Expanding For System Of Digital Mask Fabrication

Tz Shen,Hb Lv,Xm Qi,Yq Gao,Ll Wei
2004-01-01
Abstract:In the digitized gray-mask fabrication system using digital micromirror device (DMD) as spatial light modulator (SLM), to solve the limited resolution problem of intensity modulation caused by nonlinear exposure of sensitive materials, several means were put forward. When there is no limitation to exposure time or only single DOE is needed to make, the problem can be overcome by controlling the exposure time and changing the grayscale. In region of low phase levels, low grayscales and short exposure time are adopted, while big grayscales and long exposure time should be taken in deep ones. For batch production of DOEs or DOE array, new ways of grayscale expanding were held out, which can decrease the total exposure time and improve the flexibility of mask design. Combining two DMDs and changing their incident intensity ratio, equivalent grayscales can be expanded greatly. The resolution of intensity modulated by grayscales is increased markedly. So the depth of exposure can be exactly controlled. The calculation results show that six times of grayscale expanding can be easily realized in the two kinds of DMD combination and the depth error of exposure can be decreased to less than 2%.
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