Abstract:Recently, a set of gradient-based optical proximity correction (OPC) and phase shifting mask (PSM) optimization methods have been developed to solve for the inverse lithography problem under scalar imaging models, which are only accurate for numerical apertures (NA) less than approximately 0.4. However, as the lithography technology node enters the 45nm realm, immersion lithography systems with hyper-NA (NA>1) are now extensively used in the semiconductor industry. For the hyper-NA lithography systems, the vector nature of the electromagnetic field must be taken into account, leading to the vector imaging models. Thus, the OPC and PSM optimization approaches developed under the scalar imaging models are inadequate to enhance the resolution in the immersion lithography systems. This paper focuses on developing gradient-based OPC and PSM optimization algorithms under vector imaging models. The mask optimization framework is first formulated, in which the imaging process of the optical lithography system is represented by an integrative and analytic vector imaging model. The steepest descent algorithm is then used to optimize the mask iteratively. Subsequently, a generalized wavelet penalty (GWP) is proposed to improve the manufacturability of the mask, and results in smaller pattern errors and CD errors than the traditional wavelet penalty (WP). Finally, a set of algorithm acceleration techniques are exploited to speed up the proposed algorithms.

High Performance Source Optimization Using A Gradient-Based Method in Optical Lithography

Gradient-Based Source And Mask Optimization In Optical Lithography

Source and Mask Co-Optimization Using A Gradient Based Method in Optical Lithography

Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography

Hybrid Source Mask Optimization for Robust Immersion Lithography.

Pixelated Source and Mask Optimization for Immersion Lithography

Fast Source Mask Co-Optimization Method for High-Na EUV Lithography

Robust Hybrid Source and Mask Optimization to Lithography Source Blur and Flare

Pixel-based Simultaneous Source and Mask Optimization for Resolution Enhancement in Optical Lithography

Source Mask Optimization For Extreme-Ultraviolet Lithography Based On Thick Mask Model And Social Learning Particle Swarm Optimization Algorithm

Fast Pixelated Lithographic Source and Mask Joint Optimization Based on Compressive Sensing.

Gradient-based Joint Source Polarization Mask Optimization for Optical Lithography

Efficient Informatics-Based Source and Mask Optimization for Optical Lithography

Gradient-Based Resolution Enhancement Optimization Methods Based on Vector Imaging Model

Mask Optimization Approaches in Optical Lithography Based on a Vector Imaging Model

Ultra-Fast Source Mask Optimization via Conditional Discrete Diffusion

High-fidelity Source Mask Optimization for Suppressing Line-End Shortening.

Fast source mask optimization adopting mask prediction and feedback method with similarity penalty

Parametric Source-Mask-Numerical Aperture Co-Optimization for Immersion Lithography

Resolution Enhancement Optimization Methods in Optical Lithography with Improved Manufacturability

An Optimization Strategy for 65 nm Node Photomasks