Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy

Dandan Han,Tianchun Ye,Yayi Wei,Tian-chun Ye
DOI: https://doi.org/10.1039/d3na00147d
IF: 5.598
2023-01-01
Nanoscale Advances
Abstract:Nanolithography techniques providing a good scalability and feature size controllability are of great importance for the fabrication of integrated circuits (IC), MEMS/NEMS, optical devices, nanophotonics, etc. Herein, a cost-effective, easy...
materials science, multidisciplinary,nanoscience & nanotechnology,chemistry
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