Abstract:Results are presented for modelling of the evaporation and magnetron sputter deposition of Zn(x)O(y) onto an O-terminated ZnO (0001¯) wurtzite surface. Growth was simulated through a combination of molecular dynamics (MD) and an on-the-fly kinetic Monte Carlo (otf-KMC) method, which finds diffusion pathways and barriers without prior knowledge of transitions. We examine the effects of varying experimental parameters, such as substrate bias, distribution of the deposition species and annealing temperature. It was found when comparing evaporation and sputtering growth that the latter process results in a denser and more crystalline structure, due to the higher deposition energy of the arriving species. The evaporation growth also exhibits more stacking faults than the sputtered growth. Post-annealing at 770 K did not allow complete recrystallization, resulting in films which still had stacking faults where monolayers formed in the zinc blende phase, whereas annealing at 920 K enabled the complete recrystallization of some films to the wurtzite structure. At the latter temperature atoms could also sometimes be locked in the zinc blende phase after annealing. When full recrystallization did not take place, both wurtzite and zinc blende phases were seen in the same layer, resulting in a phase boundary. Investigation of the various distributions of deposition species showed that, during evaporation, the best quality film resulted from a stoichiometric distribution where only ZnO clusters were deposited. During sputtering, however, the best quality film resulted from a slightly O rich distribution. Two stoichiometric distributions, one involving mainly ZnO clusters and the other involving mainly single species, showed that the distribution of deposition species makes a huge impact on the grown film. The deposition of predominantly single species causes many more O atoms at the surface to be sputtered or reflected, resulting in an O deficiency of up to 18% in the deposited film and therefore resulting in more stacking faults and phase boundaries. The methods used allow analysis of key mechanisms that occur during the growth process and give hints as to the optimum conditions under which complete crystalline layers can form.

Reactive sputtered ZnO thin films: Influence of the O2/Ar flow ratio on the oxygen vacancies and paramagnetic active sites

Influence of O_2/Ar Flow Ratio on Microstructures and Photoluminescence of ZnO Films

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

Modulation of Optical and Electrical Properties of Sputtering-Derived Amorphous Ingazno Thin Films by Oxygen Partial Pressure

The Effects of Oxygen Partial Pressure and Substrate Temperature on the Structural and Optical Properties of Zno Films

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Influence of Ar/O2 Gas Ratios on the Crystal Quality and Band Gap of Zn1−xCdxO Thin Films

Effect of O2/(O2+Ar) Ratios on the Type of Defects in ZnO-0.25mol% V2O5 Thin Films

Spectroscopic characterization of the plasmas formed during the deposition of ZnO and Al-doped ZnO films by plasma-assisted pulsed laser deposition

Effects of Hydrogen Flux on Aluminum Doped Zinc Thin Films by Pulsed Magnetron Sputtering

Deposition and Characterization of Sputtered ZnO Films

Effects of oxygen ambient on the structural, morphological, optical and electrical properties of AZO/Ag/AZO transparent electrodes

Effect of Gas Flow Ratio on the Chemical and Electrochemical Properties of Bismuth-Oxygen Films Deposited in Reactive Phase Sputtering

Modelling the growth of ZnO thin films by PVD methods and the effects of post-annealing

Effect of Argon to Oxygen Ratio on the Properties of Tungsten Oxide Films Prepared by Direct Current Reactive Magnetron Sputtering

Effect of O_2 Flow Rate on the Properties and Growth of ZnO Thin Films

Effects of O2/Ar Ratio on Preparation and Dielectric Properties of CaZrO3 Films by Radio Frequency (RF) Magnetron Sputtering

On the Piezoelectric Properties of Zinc Oxide Thin Films Synthesized by Plasma Assisted DC Sputter Deposition

Oxidants in ZnO Thin Film Growth by LP-MOCVD

Composition characterization of Pb(Zr,Ti)O3 (PZT) thin films prepared by pulsed laser deposition: Ambient gas and substrate position effect

Oxygen Enhanced Ferromagnetism in Cr-doped ZnO Films