Performance of Junctionless and Inversion-Mode Thin-Film Transistors With Stacked Nanosheet Channels

Yu-Ru Lin,Yu-Hsien Lin,Yu-Fang Chen,Ya-Ting Hsu,Ya-Han Chen,Yu-Hsien Huang,Yung-Chun Wu
DOI: https://doi.org/10.1109/tnano.2019.2960836
2020-01-01
IEEE Transactions on Nanotechnology
Abstract:This article comprehensively investigated a junctionless thin-film transistor (JL TFT) with stacked nanosheet (NS) channels. Through experiments, we 1) compared a JL TFT with a single NS channel and a JL TFT with stacked NS channels and 2) compared an inversion-mode TFT with stacked NS channels and the JL TFT with stacked NS channels; the TFTs were fabricated using Si-based technology. The JL TFT with stacked NS channels exhibited a subthreshold slope of 135 mV/dec and drain-induced barrier-lowering value of 50.8 mVV<sup>−1</sup>, which were superior to those of the other devices. Furthermore, we simulated another device with a hybrid P/N/P channel structure based on the JL TFT by using three-dimensional technology computer aided design (3D TCAD) simulation. According to the study results, the JL TFT with stacked NS channels is a promising candidate for scaling down Si TFTs and for use in advanced 3D applications.
engineering, electrical & electronic,materials science, multidisciplinary,nanoscience & nanotechnology,physics, applied
What problem does this paper attempt to address?