Abstract:Results are presented for modelling of the evaporation and magnetron sputter deposition of Zn(x)O(y) onto an O-terminated ZnO (0001¯) wurtzite surface. Growth was simulated through a combination of molecular dynamics (MD) and an on-the-fly kinetic Monte Carlo (otf-KMC) method, which finds diffusion pathways and barriers without prior knowledge of transitions. We examine the effects of varying experimental parameters, such as substrate bias, distribution of the deposition species and annealing temperature. It was found when comparing evaporation and sputtering growth that the latter process results in a denser and more crystalline structure, due to the higher deposition energy of the arriving species. The evaporation growth also exhibits more stacking faults than the sputtered growth. Post-annealing at 770 K did not allow complete recrystallization, resulting in films which still had stacking faults where monolayers formed in the zinc blende phase, whereas annealing at 920 K enabled the complete recrystallization of some films to the wurtzite structure. At the latter temperature atoms could also sometimes be locked in the zinc blende phase after annealing. When full recrystallization did not take place, both wurtzite and zinc blende phases were seen in the same layer, resulting in a phase boundary. Investigation of the various distributions of deposition species showed that, during evaporation, the best quality film resulted from a stoichiometric distribution where only ZnO clusters were deposited. During sputtering, however, the best quality film resulted from a slightly O rich distribution. Two stoichiometric distributions, one involving mainly ZnO clusters and the other involving mainly single species, showed that the distribution of deposition species makes a huge impact on the grown film. The deposition of predominantly single species causes many more O atoms at the surface to be sputtered or reflected, resulting in an O deficiency of up to 18% in the deposited film and therefore resulting in more stacking faults and phase boundaries. The methods used allow analysis of key mechanisms that occur during the growth process and give hints as to the optimum conditions under which complete crystalline layers can form.

Study of deposition parameters and growth kinetics of ZnO deposited by aerosol assisted chemical vapor deposition

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

Deposition of Y2O3 stabilized ZrO2 thin films from Zr(DPM)4 and Y(DPM)3 by aerosol-assisted MOCVD

Fabrication and Characterization of Y2O3 Stabilized ZrO2 Films Deposited with Aerosol-Assisted MOCVD

Mist CVD Growth of ZnO-Based Thin Films and Nanostructures

Advances in Research on Deposition Techniques for ZnO Thin Films

Effect of solution concentration on surface morphology, optical properties and solar light response of ZnO thin films

AACVD Synthesis and Characterization of Iron and Copper Oxides Modified ZnO Structured Films

Modelling the growth of ZnO thin films by PVD methods and the effects of post-annealing

Numerical and Experimental Comparative Study of Metal-Organic Chemical Vapor Deposition of ZnO

Deposition and Characterization of Sputtered ZnO Films

Aerosol Assisted Chemical Vapour Deposition (AACVD) of Zinc dichalcogenoimidodiphosphinate Complexes for the Deposition of Zinc Selenide Thin Films

Aerosol assisted chemical vapour deposition of nanostructured ZnO thin films for NO2 and ethanol monitoring

Evolution of Zinc Oxide Nanostructures Through Kinetics Control.

Modeling Analysis of the Mocvd Growth of Zno Film

Study on Deposition Parameters of ZAO Films by AC Magnetron Sputtering

Oxidants in ZnO Thin Film Growth by LP-MOCVD

Structural, Morphological, and Optical Properties of Nano- and Micro-Structures of ZnO Obtained by the Vapor–Solid Method at Atmospheric Pressure and Photocatalytic Activity

X-ray Photoelectron Spectroscopy Study of ZnO Films Grown by Metal-Organic Chemical Vapor Deposition

Competitive Adsorption and Two-Site Occupation Effects in Metal-Organic Chemical Vapor Deposition of Zno

Simulation and experimental verification study on the process parameters of ZnO-MOCVD