Aerosol Assisted Chemical Vapour Deposition (AACVD) of Zinc dichalcogenoimidodiphosphinate Complexes for the Deposition of Zinc Selenide Thin Films

Temidayo Oyetunde,Martins O. Omorogie,Paul O'Brien
DOI: https://doi.org/10.1002/open.202400295
2024-12-06
ChemistryOpen
Abstract:Zinc complexes have been prepared from dichalcogenoimidodiphosphinate ligands. Aerosol‐assisted chemical vapour deposition (AACVD) of these single‐source precursors deposit thin films of cubic zinc selenide at the different deposition temperatures and flow rates of the carrier gas. Hetero‐dichalcogeno complex of zinc exclusively deposit zinc selenide Dichalcogenoimidodiphosphinate complexes of zinc [Zn{(EPiPr2)2N}2], [E=Se,Se; S,Se] were synthesized through metathetical reactions from the dichalcogenoimidodiphosphinate ligands [(EE'PiPr2NH)] (E, E'=Se, Se; S, Se). These complexes were characterized and used as single‐source precursors through Aerosol‐Assisted Chemical Vapour Deposition (AACVD) for the deposition of cubic zinc selenide (ZnSe) films on glass substrates. The deposition temperature occurred at 500 and 525 °C, while the flow rates of the carrier gas was 160 and 240 standard cubic centimetre (sccm). The morphology of the deposited films ranged between dense fibrous network and woven fibres. X‐ray photoelectron spectroscopy (XPS) confirmed the presence of the constituent elements in zinc selenide.
chemistry, multidisciplinary
What problem does this paper attempt to address?