A High Copper Concentration Copper-Quadrol Complex Electroless Solution for Chip Bonding Applications
Jeng-Hau Huang,Po-Shao Shih,Vengudusamy Renganathan,Simon Johannes Gräfner,Yu-Chun Lin,Chin-Li Kao,Yung-Sheng Lin,Yun-Ching Hung,Chengheng Robert Kao
DOI: https://doi.org/10.3390/ma17071638
IF: 3.4
2024-04-04
Materials
Abstract:This article presents a novel bonding method for chip packaging applications in the semiconductor industry, with a focus on downsizing high-density and 3D-stacked interconnections to improve efficiency and performance. Microfluidic electroless interconnections have been identified as a potential solution for bonding pillar joints at low temperatures and pressures. However, the complex and time-consuming nature of their production process hinders their suitability for mass production. To overcome these challenges, we propose a tailored plating solution using an enhanced copper concentration and plating rate. By eliminating the need for fluid motion and reducing the process time, this method can be used for mass production. The Taguchi approach is first used to optimize the copper–quadrol complex solution with the plating rate and decomposition time. This solution exhibits a copper concentration that is over five times higher than that of conventional solutions, a plating rate of 22.2 μm/h, and a decomposition time of 8 min on a Cu layer substrate. This technique enables Cu pillars to be successfully bonded within 7 min at 35 °C. Planarizing the pillar surface yields a high bonding percentage of 99%. Mechanical shear testing shows a significant fracture strength of 76 MPa.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,metallurgy & metallurgical engineering