Abstract:Ultrawide bandgap (UWBG) semiconductor materials, with bandgaps far wider than the 3.4 eV of GaN, have attracted great attention recently. As a typical representative, wurtzite aluminum nitride (AlN) material has many advantages including high electron mobility, high breakdown voltage, high piezoelectric coefficient, high thermal conductivity, high hardness, high corrosion resistance, high chemical and thermal stability, high bulk acoustic wave velocity, prominent second-order optical nonlinearity, as well as excellent UV transparency. Therefore, it has wide application prospects in next-generation power electronic devices, energy-harvesting devices, acoustic devices, optical frequency comb, light-emitting diodes, photodetectors, and laser diodes. Due to the lack of low-cost, large-size, and high-ultraviolet-transparency native AlN substrate, however, heteroepitaxial AlN film grown on sapphire substrate is usually adopted to fabricate various devices. To realize high-performance AlN-based devices, we must first know how to obtain high-crystalline-quality and controllable AlN/sapphire templates. This review systematically summarizes the recent advances in fabricating wurtzite AlN film on (0001)-plane sapphire substrate. First, we discuss the control principles of AlN polarity, which greatly affects the surface morphology and crystalline quality of AlN, as well as the electronic and optoelectronic properties of AlN-based devices. Then, we introduce how to control threading dislocations and strain. The physical thoughts of some inspirational growth techniques are discussed in detail, and the threading dislocation density (TDD) values of AlN/sapphire grown by various growth techniques are compiled. We also introduce how to achieve high thermal conductivities in AlN films, which are comparable with those in bulk AlN. Finally, we summarize the future challenge of AlN films acting as templates and semiconductors. Due to the fast development of growth techniques and equipment, as well as the superior material properties, AlN will have wider industrial applications in the future.

Low-Defect-Density Aluminum Nitride (AlN) Thin Films Realized by Zigzag Macrostep-Induced Dislocation Redirection

4-inch 11 μm high-quality AlN thick films grown on nanopatterned sapphire substrates

Fast growth of crack-free thick AlN film on sputtered AlN/sapphire by introducing high-density nano-voids

Reduced dislocation density and residual tension in AlN grown on SiC by metalorganic chemical vapor deposition

High-Quality AlN Film Grown on Sputtered AlN/Sapphire Via Growth-Mode Modification

Realization of Low Dislocation Density AlN on a Small-Coalescence-area Nano-Patterned Sapphire Substrate

Annihilation and Regeneration of Defects in (112̅2) Semipolar AlN via High-Temperature Annealing and MOVPE Regrowth

Low Defect Density Bulk Aln Substrates for High Performance Electronics and Optoelectronics

Recent Advances in Fabricating Wurtzite AlN Film on (0001)-Plane Sapphire Substrate

Evolution of microstructure, stress and dislocation of AlN thick film on nanopatterned sapphire substrates by hydride vapor phase epitaxy

Study of Defects and Nano-patterned Substrate Regulation Mechanism in AlN Epilayers

Strain management and AlN crystal quality improvement with an alternating V/III ratio AlN superlattice

High-quality AlN Epitaxy on Nano-Patterned Sapphire Substrates Prepared by Nano-Imprint Lithography

Heteroepitaxial Growth of High-Quality and Crack-Free AlN Film on Sapphire Substrate with Nanometer-Scale-Thick AlN Nucleation Layer for AlGaN-Based Deep Ultraviolet Light-Emitting Diodes

Control of dislocations in heteroepitaxial AlN films by extrinsic supersaturated vacancies introduced through thermal desorption of heteroatoms

Atomic Plane Misorientation Assisted Crystalline Quality Improvement in Epitaxial Growth of AlN on a Nanopatterned Sapphire (0001) Surface for Deep Ultraviolet Photoelectric Devices

Fast Growth of Strain-Free AlN on Graphene-Buffered Sapphire

High Quality AlN Film Grown on a Nano-Concave-circle Patterned Si Substrate with an AlN Seed Layer

High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering

Fabrication of Crack-Free Aln Film on Sapphire by Hydride Vapor Phase Epitaxy Using an in Situ Etching Method

Defect-selective Etching of Bulk AlN Single Crystals in Molten KOH/NaOH Eutectic Alloy