Study of Ge‐rich GST Device‐Dependent Segregation for Industrial Grade Embedded PCM

E. Petroni,M. Allegra,M. Baldo,L. Laurin,A. Serafini,L. Favennec,L. Desvoivres,J. Sandrini,C. Boccaccio,Y. Le-Friec,A. Ostrovsky,P. Gouraud,A. Bonnevialle,R. Ranica,A. Redaelli
DOI: https://doi.org/10.1002/pssr.202300449
2024-01-24
physica status solidi (RRL) - Rapid Research Letters
Abstract:Ge‐rich GST (GGST) alloys are the most promising materials for phase‐change memory (PCM) in embedded applications, being able to fulfill the tough data retention requirements of automotive and consumer markets. GGST alloys are sensitive to thermal budgets and spatial confinement; thus, memory device process integration and architecture can strongly impact their final electrical properties and reliability. In this work, exploiting a statistical methodology capable to extract quantitative metrics for evaluating by‐process segregation, we study the inhomogeneity of out‐of‐fab GGST material in function of process parameters such as architecture and alloy composition. We also compare the present results with the already known source of segregation, namely the BEOL thermal budget, providing a comprehensive description of the main modulating factors of segregation among these different process parameters. This article is protected by copyright. All rights reserved.
physics, condensed matter, applied,materials science, multidisciplinary
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