Abstract:Oxygen ions (O + ) were implanted into fused silica at a fixed fluence of 1 × 10 17 ions/cm 2 with different ion energies ranging from 10 keV to 60 keV. The surface roughness, optical properties, mechanical properties and laser damage performance of fused silica were investigated to understand the effect of oxygen ion implantation on laser damage resistance of fused silica. The ion implantation accompanied with sputtering effect can passivate the sub-/surface defects to reduce the surface roughness and improve the surface quality slightly. The implanted oxygen ions can combine with the structural defects (ODCs and E′ centers) to reduce the defect densities and compensate the loss of oxygen in fused silica surface under laser irradiation. Furthermore, oxygen ion implantation can reduce the Si–O–Si bond angle and densify the surface structure, thus introducing compressive stress in the surface to strengthen the surface of fused silica. Therefore, the laser induced damage threshold of fused silica increases and the damage growth coefficient decreases when ion energy up to 30 keV. However, at higher ion energy, the sputtering effect is weakened and implantation becomes dominant, which leads to the surface roughness increase slightly. In addition, excessive energy aggravates the breaking of Si–O bonds. At the same time, the density of structural defects increases and the compressive stress decreases. These will degrade the laser laser-damage resistance of fused silica. The results indicate that oxygen ion implantation with appropriate ion energy is helpful to improve the damage resistance capability of fused silica components.

Regulations of Oxygen-Silicon Ratio and Microstructure to Enhance Laser Damage Resistance of Fused Silica Via Oxygen Ion Implantation

Surface Defects, Stress Evolution, and Laser Damage Enhancement Mechanism of Fused Silica under Oxygen-Enriched Condition

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Ion Energy Dependent Initial Damage and Damage Growth in Ar-implanted Fused Silica

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

The Structure Evolution of Fused Silica Induced by CO 2 Laser Irradiation

Improved Laser Induced Damage Thresholds of Ar Ion Implanted Fused Silica at Different Ion Fluences

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Anisotropic Ion Beam Etching Of Fused Silica To Mitigate Subsurface Damage

Recovery of fused silica surface damage resistance by ion beam etching

Layer by layer exposure of subsurface defects and laser-induced damage mechanism of fused silica

Investigation of Laser-Induced Damage Threshold Improvement Mechanism During Ion Beam Sputtering of Fused Silica

Surface Evolution and Laser Damage Resistance of CO2 Laser Irradiated Area of Fused Silica

Evolution of Intrinsic Defects and Ring Structures on the Surface of Fused Silica Optics after CO2 Laser Conditioning.

Material migration and damage characteristics of fused silica optical surface treated by CO 2 laser/short – pulse ultraviolet laser

Research on Laser-Induced Damage Post-Restoration Morphology of Fused Silica and Optimization of Patterned CO2 Laser Repair Strategy

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Damage Growth Characteristics on the Exit Surface of Fused Silica by the Low-Temporal Coherence Light Irradiation.

A two-step physical-chemical etching technique to improve laser damage resistance of fused silica

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica