Effective Suppression of Vt Roll-Up for Pmos with Embedded SiGe Source/Drain

Hao Liu,Song He,Cheng-Hao Liang,Ran Bi,Yu-Long Jiang,Jing Wan
DOI: https://doi.org/10.1109/ted.2024.3405469
IF: 3.1
2024-01-01
IEEE Transactions on Electron Devices
Abstract:The anomalous roll-up of the absolute value of threshold voltage (|V-t|) is observed for pMOS with embedded SiGe source/drain (eSiGe S/D) as the gate width decreases. It is revealed that the raised eSiGe height reduction for the wide pMOS may result in more B atoms diffusion into channel region from Si cap layer, causing the net doping level decrease of channel region as well as |V-t| . The wider the pMOS, the smaller the |V-t| is; similar to 60% |V-t| increase can be observed as the gate width decreases. It is demonstrated that increasing the raised eSiGe height together with reducing B concentration in Si cap layer can effectively realize 20% |V-t| decrease without the pMOS performance degradation.
What problem does this paper attempt to address?