Local Atomic Structure of GeSi Alloy Semiconductors

Ichiro Yonenaga,Masaki Sakurai
1999-01-01
Abstract:Introduction Germanium-silicon is a complete solid solution system. The 4% difference in the lattice constants of constituent Ge and Si atoms leads various unique alloying effects on electronic, optical and mechanical properties. Knowing the accurate local structure is important to clarify the origin, relevant to the local strain relaxation. Here we report results of the detailed analysis for XAFS measurements of bulk crystalline GeSi alloys in the whole composition, preliminarily reported [1].
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