A Novel Non-Situ Thickness Control Method for a Single Anti-Reflection Coating Thin Film Based on Reflection Spectrum Analysis

Yi Luo
2010-01-01
Abstract:A novel non-situ film thickness control method based on reflection spectrum analysis is proposed for anti-reflection(AR) coating,which is especially suitable for optoelectronic devices with small facet area.The refractive index of the coating film in 300-1 700 nm wavelength range is evaluated by spectroscopic ellipsometery,and the optimum deposition conditions for AR coating film are determined at a specified wavelength(e.g.1 550 nm).The reflection spectrum of AR coating with optimum film thickness and its CIE chromatography coordinates can be estimated accordingly.By comparing the measured color of the thin film on coated device against the optimum value,the thickness of AR coating can be controlled to minimize the facet reflection.Based on this method,a single layer AR coating of SiNx with residual reflection as low as 4.4×10-4 is demonstrated by plasma enhanced chemical vapor deposition(PECVD).
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