Plasma-enhanced atomic-layer-deposited HfO 2 –SiO 2 nanolaminates for broadband antireflection coatings

Xuechen Zhang,Tingting Zeng,Chen Song,Jianda Shao,Meiping Zhu
DOI: https://doi.org/10.1016/j.optmat.2024.115282
IF: 3.754
2024-04-02
Optical Materials
Abstract:The ever-increasing demand for broadband antireflection (AR) coatings has led to a growing interest in nanolaminates (NLs) with tunable properties. However, achieving excellent optical performance in NLs can be challenging due to multiple interfaces and a rather thin sublayer. In this study, we systematically investigated the factor that deteriorates the optical performance, focusing on the sublayer thickness deviation, sublayer n deviation, and interfacial diffusion, to correct the n -profiles of NLs. A pre-correction strategy for the AR coating design is proposed and experimentally demonstrated via plasma-enhanced atomic layer deposition. The excellent fit of the spectrum demonstrates that the proposed design strategy can benefit structure-sensitive NL-based coatings.
materials science, multidisciplinary,optics
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