Abstract:HfO2 prepared by ion beam sputtering (IBS) is widely used as a high-refractive index material for making low-loss laser films. The challenge of a high-performance HfO2 film is to simultaneously obtain an amorphous morphology with low scattering and a stoichiometric structure with low absorption. Furthermore, nanometer-sized voids are commonly present in IBS films due to excessive oxygen and argon adsorption during deposition, which is the primary barrier to achieve a smooth surface and low optical loss of HfO2. Thin amorphous SiO2 layers were added periodically into HfO2 coatings using the IBS process to synthesize amorphous HfO2 / SiO2 nanolaminate-based composites. The resulting composites exhibited excellent comprehensive performance with a dense amorphous microstructure and a void-free smooth surface. High-temperature annealing was performed to ensure superior stoichiometry and lower absorption. However, the crystalline states and microstructure of some composites evolved during the gradual annealing. We present a detailed study of the crystallization, surface topography, and absorption evolution in HfO2 / SiO2 nanolaminates as a function of HfO2 sublayer thickness and thermal annealing temperature. Moreover, the interplay between crystallization, surface topography, and absorption is elucidated. The HfO2 / SiO2 nanolaminate with 19 thin layers maintained a dense amorphous structure with low absorption after annealing. Finally, a 1064-nm HfO2 / SiO2 nanolaminate-SiO2 high-performance reflector was prepared and achieved lower absorption with a smooth surface after annealing, which demonstrated the great potential of the HfO2 / SiO2 nanolaminates for considerably improving optical loss. (c) 2021 Society of PhotoOptical Instrumentation Engineers (SPIE)

Nanostructuring Hfo2 Thin Films As Antireflection Coatings

Nanostructuring HfO<sub>2</sub>Thin Films as Antireflection Coatings

Microstructure Optimization and Optical and Interfacial Properties Modulation of Sputtering-Derived Hfo2 Thin Films by Tio2 Incorporation

Wide-angle Broadband Antireflection with Nano-taper Hydrated Alumina Film

Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Thermal Stability of Hfo2 Nanostructures As Antireflection Coatings

Microstructure, Optical Properties, and Optical Resonators of Hf1-Xtixo2 Amorphous Thin Films

Antireflective Coatings: HfO2 Nanorod Array as High-Performance and High-Temperature Antireflective Coating (Adv. Mater. Interfaces 6/2017)

HfO2 Nanorod Array As High‐Performance and High‐Temperature Antireflective Coating

Fabrication and performances of double-sided HfO2 anti-reflection films with ultra-high infrared transmittance

Nanoporous Silicon Dioxide Films for Large Area and Low-Cost Fabrication of Ultra-Low Refractive Index Coatings

Hafnia/silica Nanolaminate-Based Design for High Performance Laser Films with Low Optical Loss

HfO2/SiO2 Nanolaminate-Based Composites Prepared by Ion Beam Sputtering for Low-Loss Optics

Reducing optical loss of dual-ion beam sputtered HfO2 films via optimization of coating and annealing parameters

Plasma-enhanced atomic-layer-deposited HfO 2 –SiO 2 nanolaminates for broadband antireflection coatings

Hydrophobic Surface Modified HfO2 Antireflective Coatings

Morphology In-Design Deposition of Hfo2 Thin Films

Influence of O2/Ar Flow Ratio on the Structure and Optical Properties of Sputtered Hafnium Dioxide Thin Films

High performance hierarchical nanoporous antireflective films by a facile sol–gel process

Annealing behaviors of structural, interfacial and optical properties of HfO 2 thin films prepared by plasma assisted reactive pulsed laser deposition

Tuning the peak position of subwavelength silica nanosphere broadband antireflection coatings.