Abstract:Antireflection (AR) coatings are essential to the performance of optical systems; without them, surface reflections increase significantly at steep angles and become detrimental to the functionality. AR coatings apply to a wide range of applications from solar cells and laser optics to optical windows. Many times, operational conditions include high temperatures and steep angles of incidence (AOIs). The implementation of AR coatings is extremely challenging in these conditions. Nanoporous coatings made from high-temperature-tolerant materials offer a solution to this problem. The careful selection of materials is needed to prevent delamination when exposed to high temperatures, and an optimal optical design is needed to lower surface reflections at both the normal incidence and steep AOIs. This paper presents nanoporous silicon dioxide and hafnium dioxide coatings deposited on a sapphire substrate using oblique angle deposition by electron beam evaporation, a highly accurate deposition technique for thin films. Developed coatings were tested in a controlled temperature environment and demonstrated thermal stability at temperatures up to 800°C. Additional testing at room temperature demonstrated the reduction of power reflections near optimal for AOIs up to 70° for a design wavelength of 1550 nm. These findings are promising to help extend the operation of technology at extreme temperatures and steep angles.

Thermal Stability of Hfo2 Nanostructures As Antireflection Coatings

Annealing Temperature Dependent Microstructure and Optical Properties of HfxTi1-xO2 Thin Films

Annealing Temperature Dependence on the Structural and Optical Properties of Sputtering-Grown High-K HfO2 Gate Dielectrics

Microstructure, Optical, Electrical Properties, and Leakage Current Transport Mechanism of Sol–gel-Processed High-K HfO2 Gate Dielectrics

Thermal and Voltage Instabilities of Hafnium Oxide Films Prepared by Sputtering Technique

Nanostructuring Hfo2 Thin Films As Antireflection Coatings

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Nanostructuring HfO<sub>2</sub>Thin Films as Antireflection Coatings

Thermal Stability, Structural and Electrical Characteristics of the Modulated Hfo2/Al2o3 Films Fabricated by Atomic Layer Deposition

Annealing Influence on Optical Performance of HfO2 Thin Films

Microstructure, Optical Properties, and Optical Resonators of Hf1-Xtixo2 Amorphous Thin Films

Thermal Stability of Electrical and Magnetic Properties of a Nanocrystalline Hf-Ni Alloy

Thermal Stability of Fe2o3 Nanowires

Effect of Heat Treatment on Properties of HfO2 Film Deposited by Ion-Beam Sputtering

Impact of post deposition annealing in O2 ambient on structural properties of nanocrystalline hafnium oxide thin film

Structure and Optical Properties of Hfo2 Thin Films on Silicon after Rapid Thermal Annealing

Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition

High Thermal Stability of Nanostructured Al Mediated by Heterophase Interfaces and Nanotwinning

Influence of Hf on the Structure, Thermal Stability and Oxidation Resistance of Ti-Al-N Coatings

Nanoporous antireflection coating for high-temperature applications in the infrared

Temperature-Dependent HfO 2 /Si Interface Structural Evolution and its Mechanism