Microstructure Stabilization and Morphology Evolution in Al/Ta Nano-multilayers
Kewei Xu,Moe Key
2010-01-01
Nanoscience and Nanotechnology
Abstract:Al/Ta multilayers with bilayer thickness ranging from 18 to 108 nm were fabricated by dc magnetron sputtering technique. By evaluating the cross -sectional transmission electron microscopy images of the nanoscale multilayers, the stabilization of the deposited microstructure morphology were investigated. For the first time, a unique evolution process of the structure instabilities in metal multilayers was observed and evaluated, in which four stages were identified. Farther analysis of the four sages found that microstructure morphological instabilities were dominated by elastic misfit. The formation of microstructure morphological instabilities was deducted to find the characterization factors in Al/Ta multilayers with various bilayer thicknesses. The Al/Ta multilayers deformed in uniaxial tension test show that microstructure morphological instabilities strongly influence the mechanical property. The zones of instabilities break down the continuum of films and are key points of formation of cracks.
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