Microstructures and stress of Fe/Mo multilayer films

Dan Li,Ding He,Feng Pan

2004-01-01

Abstract:Fe/Mo multilayer films with varying Fe and Mo layer thickness were grown by electron beam evaporation. Influence of both Fe and Mo layer thickness on microstructures and interfacial stress of the multilayers was studied with transmission electron microscopy (TEM) and X-ray diffraction (XRD). The results show that when the Mo layer is much thicker than Fe layer, 1.2 nm in thickness, fairly stable Fe layer with a bcc structure grows epitaxially on Mo layer. Large thickness difference between Mo and Fe layers produces rather high interfacial stress, resulting in small surface cracks.