Microstructure and magnetic behaviors of Fe/Hf multilayers by vapor deposition

Z.S Zhang,M Zhang,F Pan

DOI: https://doi.org/10.1016/S0304-8853(98)00368-0

IF: 3.097

1999-01-01

Journal of Magnetism and Magnetic Materials

Abstract:Electron beam vapor deposition was employed to prepare Fe/Hf multilayers. The thickness, periodicity, chemical composition, microstructure and magnetic properties of the films were characterized and measured by various methods. It was found that the Fe layer could grow in an amorphous structure when the Fe layer thickness tFe⩽2.2nm and the Hf layer thickness 1.8nm⩽tHf⩽13.2nm. The magnetic moment per Fe atom in Fe/Hf multilayers reduced considerably with forming amorphous Fe when Hf was fixed at 13.2nm. For the Fe/Hf multilayers with amorphous Fe, the magnetic moment per Fe atom changed strongly with the thickness of constituent metals. Possible mechanism responsible for these observations are also discussed.