Structure and Magnetic Properties of Fe/Al Multilayers Synthesized by Planar Magnetron Sputtering

JF WANG,FZ CUI,Y WANG,YD FAN

DOI: https://doi.org/10.1016/0304-8853(90)90719-7

IF: 3.097

1990-01-01

Journal of Magnetism and Magnetic Materials

Abstract:Two series Fe/Al multilayered films have been prepared by means of planar magnetron sputtering. The dependence of structure and magnetic properties on the thickness of Fe layer (dFe) or the thickness of Al layer (dAl) has been investigated. In series 1 multilayers for which we fixed dAl at 2.2 nm and varied dFe from 0.95 to 11.4 nm, the crystal orientation of the multilayers was Fe(110)Al(200) for dFe in the range of 1.9–11.4 nm, the saturation magnetization 4πMs decreased Hc decreased with decreasing dFe. For dFe less than 1.9 nm, the structure was amorphous and the value of 4πMs decreased abruptly from 1.16 to 0.28 T and Hc increased abruptly from 9.3 to 71.3 Oe. In series 2 multilayers for which we fixed the thickness ratio at dFe/dAl=1.7 and varied the period D from 3 to 18 nm, the crystal orientation was Fe(110)Al(200) for dAl less than 4.4 nm (dFe < 7.6 nm) and Fe(110)Al(200) + (111) for dAl larger than 4.4 nm. The value of 4πMs was found to be 1.48–1.54 T, while Hc decreased with decreasing dFe. The reasons for the changes of the crystal orientation, 4πMs and Hc with dFe have also been discussed.