Abstract:Self-assembled monolayers (SAMs) of alkanethiols have been patterned on micrometre and nanometre length scales by exposure to light from a frequency doubled argon ion laser. Friction force microscopy shows that the patterning speed depends on the nature of the terminal group and is in the order COOH > CH3, the reverse of the order reported previously using a mercury arc lamp, indicating that a different photo-oxidation mechanism is responsible. It is suggested that this involves the creation of hot electrons at the gold surface that initiate oxidation of the adsorbate. Nanostructures have been fabricated using scanning near-field photolithography (SNP), in which the UV laser is coupled to a near-field scanning optical microscope. During SNP, the rates of writing required for complete oxidation correlate closely with oxidation rates measured during micropatterning, suggesting that the mechanism is essentially the same. SAMs on silver have been patterned, yielding linewidths smaller than 50 nm. The selective alkylation of hydrogen passivated Si has been demonstrated, yielding structures that may be used as resists for etching and demonstrating a powerful new capability-fluid-phase nanophotolithography. Patterned SAMs prepared using SNP have been used to selectively attach polymer nanoparticles, demonstrating their utility for the creation of functional molecular nanostructures. Nanopatterns generated by SNP have also been used as resists, enabling the etching of nanostructures into gold and the fabrication of three-dimensional nanostructures in silicon using a two-stage wet etch process.

Area-selective Deposition of Self-Assembled Monolayers on a Synchrotron Radiation Etching Pattern

Area-selective Deposition of Self-Assembled Monolayers on SiO2∕Si(100) Patterns

Synchrotron Radiation Stimulated Etching SiO/sub 2/ Thin Films with a Co Contact Mask for the Area-Selective Deposition of Self-Assembled Monolayer

Electrochemical Studies on Self-Assembled Monolayer (sam) Upon Exposure to Anionic Surfactants: Pfoa, Pfos, Sds and Sdbs

Selective Functionalization of Silicon Surface Controlled by Metastable Helium Atom Beam for Patterning Chemisorbed Monolayer Molecular Assemblies

Preparation of Hydrophobic/Superhydrophobic Surface on Silicon Wafer by Reactive Ion Etching and Self-assembled Monolayers

In situ differential atomic force microscopy (AFM) measurement for ultra-thin Thiol SAM patterns by area-selective deposition technique

Area Selective Atomic Layer Deposition by Soft Lithography

Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS) Profiling of Self Assembled Monolayer (SAM) Patterns Based on Vapor Deposition Technique

Fabrication of Patterned Self-Assembled Monolayers on Silicon Substrate

Improving Area-Selective Molecular Layer Deposition by Selective SAM Removal

Preparation and Characterization of 1-Hexadecene Thin Film on Silicon Surface

Area-Selective Atomic Layer Deposition Using Self-Assembled Monolayer and Scanning Probe Lithography

Photopatterning of self-assembled monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

Self-assembled monolayers preparation of patterned Hf0 2 thin film

Achieving Area-Selective Atomic Layer Deposition on Patterned Substrates by Selective Surface Modification

Site-selective assembly of quantum dots on patterned self-assembled monolayers fabricated by laser direct-writing.

A Novel Nanolithography Technique for Self-Assembled Monolayers Using a Current Sensing Atomic Force Microscope

Self-assembled silane monolayers: A step-by-step high speed recipe for high-quality, low energy surfaces

Formation of Nanopatterns of a Self-Assembled Monolayer (SAM) Within a SAM of Different Molecules Using a Current Sensing Atomic Force Microscope

Spatial Control over Atomic Layer Deposition Using Microcontact-Printed Resists