Self-assembled monolayers preparation of patterned Hf0 2 thin film

TAN Guo-Qiang,HE Zhong-Liang,MIAO Hong-Yan,Jian Liu,Ao Xia,LOU Jing-Jing
2009-01-01
Chinese journal of inorganic chemistry
Abstract:Different kinds of micro-patterns were created within octadecyltrichlorosilane (OTS) self-assembled monolayers utilizing UV lithography. The Hf0 2 pattern films have been formed on silanol SAMs by the liquid-phase deposition (LPD) method. The crystal phase composition, microstructure and topography of the as-prepared films were characterized by various techniques, including X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and energy disperse spectroscopy (EDS). The results indicate that the Hf0 2 pattern films were successfully prepared by the self-assembled monolayers, and the thin films had cubic pattern microstructure of Hf0 2, 10 μm deposited lines width and small line edge roughness.
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