Pulmonary arteriosclerosis produced by hyperoxemic normotensive perfusion.

L. Cohn,J. Kosek,W. Angell

DOI: https://doi.org/10.5555/URI:PII:0039606071900419

IF: 4.348

1971-11-01

Surgery

Abstract:

What problem does this paper attempt to address?

Patterning of Supported Gold Monolayers Via Chemical Lift-off Lithography

Liane S. Slaughter,Kevin M. Cheung,Sami Kaappa,Huan H. Cao,Qing Yang,Thomas D. Young,Andrew C. Serino,Sami Malola,Jana M. Olson,Stephan Link,Hannu Hakkinen,Anne M. Andrews,Paul S. Weiss

DOI: https://doi.org/10.3762/bjnano.8.265

IF: 3.1

2017-01-01

Beilstein Journal of Nanotechnology

Abstract:The supported monolayer of Au that accompanies alkanethiolate molecules removed by polymer stamps during chemical lift-off lithography is a scarcely studied hybrid material. We show that these Au–alkanethiolate layers on poly(dimethylsiloxane) (PDMS) are transparent, functional, hybrid interfaces that can be patterned over nanometer, micrometer, and millimeter length scales. Unlike other ultrathin Au films and nanoparticles, lifted-off Au–alkanethiolate thin films lack a measurable optical signature. We therefore devised fabrication, characterization, and simulation strategies by which to interrogate the nanoscale structure, chemical functionality, stoichiometry, and spectral signature of the supported Au–thiolate layers. The patterning of these layers laterally encodes their functionality, as demonstrated by a fluorescence-based approach that relies on dye-labeled complementary DNA hybridization. Supported thin Au films can be patterned via features on PDMS stamps (controlled contact), using patterned Au substrates prior to lift-off (e.g., selective wet etching), or by patterning alkanethiols on Au substrates to be reactive in selected regions but not others (controlled reactivity). In all cases, the regions containing Au–alkanethiolate layers have a sub-nanometer apparent height, which was found to be consistent with molecular dynamics simulations that predicted the removal of no more than 1.5 Au atoms per thiol, thus presenting a monolayer-like structure.
Controlled Grafting of Well-Defined Polymers on Hydrogen-Terminated Silicon Substrates by Surface-Initiated Atom Transfer Radical Polymerization

W. H. Yu,E. T. Kang,K. G. Neoh,Shiping Zhu

DOI: https://doi.org/10.1021/jp034330s

2003-01-01

Abstract:Controlled grafting of well-defined polymer brushes on the hydrogen-terminated Si(100) substrates (the Si-H substrate) was carried out via the surface-initiated atom transfer radical polymerization (ATRP). Surface initiators were immobilized on the Si-H substrates in three consecutive steps: (i) coupling of an omega-unsaturated alkyl ester to the Si-H surface under UV irradiation, (ii) reduction of the ester groups by LiAlH4, and (iii) esterification of the surface-tethered hydroxyl groups with 2-bromoisobutyrate bromide. Homopolymer brushes of methyl methacrylate (MMA), (2-dimethylamino)ethyl methacrylate (DMAEMA), and poly(ethylene glycol) monomethacrylate (PEGMA) were prepared by ATRP from the alpha-bromoester functionalized silicon surface. The chemical composition and topography of the graft-functionalized silicon surfaces were characterized by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM), respectively. Kinetic studies revealed a linear increase in polymer film thickness with reaction time, indicating that chain growth from the surface was a controlled process with a "living" characteristic. Diblock copolymer brushes consisting of PMMA and PDMAEMA blocks were obtained by using the homopolymer brushes as the macroinitiators for the ATRP of the second monomer, providing further evidence to the existence of "living" chain ends. ATRP from the Si-H surfaces allowed the preparation of polymeric-inorganic hybrid materials with well-structured surface and interface.
Chemical Modification on Top of Nanotopography to Enhance Surface Properties of PDMS

Jueyu Li,Min Wang,Yanbin Shen

DOI: https://doi.org/10.1016/j.surfcoat.2011.09.052

2012-01-01

Abstract:In the present study we report the surface modification of polydimethylsiloxane (PDMS) via combining both physical and chemical modification routes. Well defined nanostructures were created on PDMS surface through anodized aluminum oxide (AAO) template method. On top of the nanostructures, polyvinyl alcohol (PVA) was coated after the nano patterned PDMS was exposed to air plasma. The influence of the combined modification on surface properties of PDMS was examined by ATR-FTIR and water contact angle measurement. The impact of plasma pretreatment time and storage time in ambient environment were investigated, and property of films with or without nanostructures was compared. Experimental results show that long-term stable hydrophilic surfaces of PDMS can be achieved by PVA coating and be further improved by the surface nanostructures. The modified PDMS was also used for cell culture. The results indicate that both nanostructuring and chemically modifying the PDMS surface improves cell growth. Additionally, combination of these surface modifications has an additive effect on cell proliferation.
Vesicle Array-Templated Large-Area Silica Surface Patterns

QH Shi,JF Wang,MD Wyrsta,GD Stucky

DOI: https://doi.org/10.1021/ja052815j

IF: 15

2005-01-01

Journal of the American Chemical Society

Abstract:Micropatterning has important applications in a wide range of areas, including microelectronics, optics, information displays, and biotechnology. Herein, we describe a vesicle-array templating approach for the generation of surface patterns of micrometer-sized silica features on the surfaces of silica monoliths. The approach makes use of tetraethyl orthosilicate as silica precursor, a poly(ethylene glycol)-block-poly(propylene glycol)-block-poly(ethylene glycol) triblock copolymer, EO2PO16EO2, as surfactants, and water, ethanol, and dimethylformamide as solvents. The morphological shapes of produced silica features are synthetically controlled through varying the sequence of silica precursor hydrolysis, vesicle formation, and silica condensation. Prehydrolysis of the silica precursor, before being mixed with the copolymer, gives hollow convex protrusions. Direct mixing of the silica precursor and the copolymer produces concave depressions. An increase in the amount of water in the mixture solution without prehydrolysis of the silica precursor results in hierarchical patterns of larger concave depressions attached with smaller convex protrusions. It has further been demonstrated that concave surface patterns can function as microlens arrays that are capable of producing numerous optical images from a common object.
Designing mamdani type fuzzy rule using a collaborative FCM scheme

Chin-Teng Lin,M. Prasad,Jyh-Yeong Chang

DOI: https://doi.org/10.1109/IFUZZY.2013.6825450

2013-12-01

Abstract:This paper presents a new approach for generating fuzzy rules for fuzzy inference system by using collaborative fuzzy c-mean (CFCM). In order to do any mode of integration between datasets, there is a need to define the common feature between datasets by using some kind of collaborative process and also need to preserve the privacy and security at higher levels. This collaboration process gives a common structure between datasets which helps to define an appropriate number of rules for structural learning and also improve the accuracy of the system modeling. This all consideration bring the concept of collaborative fuzzy rule generation process with a quality measuring.
Digoxin radioimmunoassay: Capabilities and limitations

T. W. Smith

DOI: https://doi.org/10.1007/BF01086154

1976-04-01

Journal of Pharmacokinetics and Biopharmaceutics

Abstract:
Synthesis of polymer-silica hybrid microparticles with defined geometry using surface initiated atom transfer radical polymerization

y lang,f del monte,david p finn,w wang,abhay pandit

DOI: https://doi.org/10.1039/c5py00228a

IF: 4.6

2015-01-01

Polymer Chemistry

Abstract:Nanostructured polymer/silica hybrid materials have gained attention as they combine the advantageous properties of organic and inorganic materials in one entity. Herein, we report incorporation of chloromethyl moieties into a living diatom to prepare an alkyl-halide activated siliceous biotemplate. Subsequent, in situ polymerization via surface initiated atom transfer radical polymerization generated a polymer/silica microparticle with defined geometry.
Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

Cheng Huang,Markus Moosmann,Jiehong Jin,Tobias Heiler,Stefan Walheim,Thomas Schimmel

DOI: https://doi.org/10.3762/bjnano.3.71

IF: 3.1

2012-09-04

Beilstein Journal of Nanotechnology

Abstract:A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters and conditions, including the ambient atmosphere (humidity), the molar mass of the polystyrene (PS) and poly(methyl methacrylate) (PMMA), and the mass ratio between the two polymers in the blend solution, the formation of a purely lateral morphology (PS islands standing on the substrate while isolated in the PMMA matrix) can be reproducibly induced. Either of the formed phases (PS or PMMA) can be selectively dissolved afterwards, and the remaining phase can be used as a lift-off mask for the formation of a nanopatterned functional silane monolayer. This “monolayer copy” of the polymer phase morphology has a topographic contrast of about 1.3 nm. A demonstration of tuning of the PS island diameter is given by changing the molar mass of PS. Moreover, polymer blend lithography can provide the possibility of fabricating a surface with three different chemical components: This is demonstrated by inducing breath figures (evaporated condensed entity) at higher humidity during the spin-coating process. Here we demonstrate the formation of a lateral pattern consisting of regions covered with 1 H ,1 H ,2 H ,2 H -perfluorodecyltrichlorosilane (FDTS) and (3-aminopropyl)triethoxysilane (APTES), and at the same time featuring regions of bare SiO x . The patterning process could be applied even on meter-sized substrates with various functional SAM molecules, making this process suitable for the rapid preparation of quasi two-dimensional nanopatterned functional substrates, e.g., for the template-controlled growth of ZnO nanostructures Bauermann, L. P.; Gerstel, P.; Bill, J.; Walheim, S.; Huang, C.; Pfeifer, J.; Schimmel, T. Langmuir 2010, 26, 3774–3778. doi:10.1021/la903636k.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
Micropatterned Charge Heterogeneities via Vapor Deposition of Aminosilanes

Christian Pick,Christopher Argento,German Drazer,Joelle Frechette

DOI: https://doi.org/10.48550/arXiv.1609.05242

2016-09-16

Soft Condensed Matter

Abstract:Aminosilanes are routinely employed for charge reversal or to create coupling layers on oxide surfaces. We present a chemical vapor deposition method to pattern mica surfaces with regions of high-quality aminosilane (3-aminopropyltriethoxysilane, APTES) monolayers. The approach relies on the vapor deposition of an aminosilane through a patterned array of through-holes in a PDMS (poly(dimethylsiloxane)) membrane that acts as a mask. In aqueous solutions the surfaces have regular patterns of charge heterogeneities with minimal topographical variations over large areas. This versatile dry lift-off deposition method alleviates issues with multilayer formation and can be used to create charge patterns on curved surfaces. We identify the necessary steps to achieve high quality monolayers and charge reversal of the underlying mica surface: 1) hexane extraction to remove unreacted PDMS oligomers from the membrane that would otherwise deposit on and contaminate the substrate, 2) oxygen plasma treatment of the top of the membrane surfaces to generate a barrier layer that blocks APTES transport through the PDMS, and 3) decrease of the vapor pressure of APTES during deposition to minimize APTES condensation at the mica-membrane-vapor contact lines and to prevent multilayer formation. Under these conditions, AFM imaging shows that the monolayers have a height of 0.9nm with an increase in height up to 3nm at the mica-membrane-vapor contact lines. Fluorescence imaging demonstrates pattern fidelity on both flat and curved surfaces, for feature sizes that vary between 6.5-40 um. We verify charge reversal by measuring the double layer forces between a homogeneous APTES monolayers and a mica surface in aqueous solution and we characterize the surface potential of APTES monolayers by measuring the double layer forces between identical APTES surfaces. We obtain a surface potential of 110mV at pH 4.0.
Spatial resolution in thin film deposition on silicon surfaces by combining silylation and UV/ozonolysis

Lei Guo,Francisco Zaera

DOI: https://doi.org/10.1088/0957-4484/25/50/504006

IF: 3.5

2014-11-28

Nanotechnology

Abstract:A simple procedure has been developed for the processing of silicon wafers in order to facilitate the spatially resolved growth of thin solid films on their surfaces. Specifically, a combination of silylation and UV/ozonolysis was tested as a way to control the concentration of the surface hydroxo groups required for subsequent atomic layer deposition (ALD) of metals or oxides. Water contact angle measurements were used to evaluate the hydrophilicity/hydrophobicity of the surface, a proxy for OH surface coverage, and to optimize the UV/ozonolysis treatment. Silylation with hexamethyldisilazane, trichloro(octadecyl)silane, or trimethylchlorosilane was found to be an efficient way to block the hydroxo sites and to passivate the underlying surface, and UV/O3 treatments were shown to effectively remove the silylation layer and to regain the surface reactivity. Both O3 and 185 nm UV radiation were determined necessary for the removal of the silylation layer, and additional 254 nm radiation was found to enhance the process. Attenuated total reflection-infrared absorption spectroscopy was employed to assess the success of the silylation and UV/O3 removal steps, and atomic force microscopy data provided evidence for the retention of the original smoothness of the surface. Selective growth of HfO2 films via TDMAHf + H2O ALD was seen only on the UV/O3 treated surfaces; total inhibition of the deposition was observed on the untreated silylated surfaces (as determined by x-ray photoelectron spectroscopy and ellipsometry). Residual film growth was still detected on the latter if the ALD was carried out at high temperatures (250 °C), because the silylation layer deteriorates under such harsh conditions and forms surface defects that act as nucleation sites for the growth of oxide grains (as identified by electron microscopy and scanning electron microscopy). We believe that the silylation-UV/O3 procedure advanced here could be easily implemented for the patterning of surfaces in many microelectronic applications.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
XPS and AFM Characterization of the Self‐assembled Molecular Monolayers of a 3‐aminopropyltrimethoxysilane on Silicon Surface, and Effects of Substrate Pretreatment by UV‐irradiation

Nai-Yi Cui,Chaozong Liu,Wantai Yang

DOI: https://doi.org/10.1002/sia.3698

2010-01-01

Surface and Interface Analysis

Abstract:The self-assembled (SA) molecular monolayers of a 3-aminopropyltrimethoxysilane (3-APTS) on a silicon (111) surface, and the effects of ultraviolet (UV) pre-treatment for substrates on the assembling process have been studied using XPS and atomic force microscopy (AFM). The results show that the SA 3-APTS molecules are bonded to the substrate surface in a nearly vertical orientation, with a thickness of the monolayer of about 0.8-1.5 nm. The SA molecular monolayers show a substantial degree of disorder in molecular packing, which are believed to result from the interactions of amine tails in the silane molecules used with surface functionalities of the substrates, and the oxygen-containing species from the ambient. UV irradiation for silicon substrates prior to the self-assembly reaction can enhance the assembly process and hence, significantly increase the coverage of the monolayer assembled for the substrates. Copyright (C) 2010 John Wiley & Sons, Ltd.
Solid-Phase Microcontact Printing for Precise Patterning of Rough Surfaces: Using Polymer-Tethered Elastomeric Stamps for the Transfer of Reactive Silanes

Pinar Akarsu,Richard Grobe,Julius Nowaczyk,Matthias Hartlieb,Stefan Reinicke,Alexander Böker,Marcel Sperling,Martin Reifarth,Alexander Böker

DOI: https://doi.org/10.1021/acsapm.1c00024

2021-04-07

ACS Applied Polymer Materials

Abstract:We present a microcontact printing (μCP) routine suitable to introduce defined (sub-) microscale patterns on surface substrates exhibiting a high capillary activity and receptive to a silane-based chemistry. This is achieved by transferring functional trivalent alkoxysilanes, such as (3-aminopropyl)-triethoxysilane (APTES) as a low-molecular weight ink via reversible covalent attachment to polymer brushes grafted from elastomeric polydimethylsiloxane (PDMS) stamps. The brushes consist of poly{N-[tris(hydroxymethyl)-methyl]acrylamide} (PTrisAAm) synthesized by reversible addition-fragmentation chain-transfer (RAFT)-polymerization and used for immobilization of the alkoxysilane-based ink by substituting the alkoxy moieties with polymer-bound hydroxyl groups. Upon physical contact of the silane-carrying polymers with surfaces, the conjugated silane transfers to the substrate, thus completely suppressing ink-flow and, in turn, maximizing printing accuracy even for otherwise not addressable substrate topographies. We provide a concisely conducted investigation on polymer brush formation using atomic force microscopy (AFM) and ellipsometry as well as ink immobilization utilizing two-dimensional proton nuclear Overhauser enhancement spectroscopy (1H-1H-NOESY-NMR). We analyze the μCP process by printing onto Si-wafers and show how even distinctively rough surfaces can be addressed, which otherwise represent particularly challenging substrates.

polymer science,materials science, multidisciplinary
"Click" Patterning of Self-Assembled Monolayers on Hydrogen-Terminated Silicon Surfaces and Their Characterization Using Light-Addressable Potentiometric Sensors.

S. Krause,Jian Wang,M. Watkinson,Jingyuan Zhu,Fan Wu

DOI: https://doi.org/10.1021/acs.langmuir.5b02069

IF: 3.9

2015-08-25

Langmuir

Abstract:Two potential strategies for chemically patterning alkyne-terminated self-assembled monolayers (SAMs) on oxide-free silicon or silicon-on-sapphire (SOS) substrates were investigated and compared. The patterned surfaces were validated using a light-addressable potentiometric sensor (LAPS) for the first time. The first strategy involved an integration of photolithography with "click" chemistry. Detailed surface characterization (i.e. water contact angle, ellipsometry, AFM, and XPS) and LAPS measurements showed that photoresist processing not only decreases the coverage of organic monolayers but also introduces chemically bonded contaminants on the surfaces, thus significantly reducing the quality of the SAMs and the utility of "click" surface modification. The formation of chemical contaminants in photolithography was also observed on carboxylic acid- and alkyl-terminated monolayers using LAPS. In contrast, a second approach combined microcontact printing (μCP) with "click" chemistry; that is azide (azido-oligo(ethylene glycol) (OEG)-NH2) inks were printed on alkyne-terminated SAMs on silicon or SOS through PDMS stamps. The surface characterization results for the sample printed with a flat featureless PDMS stamp demonstrated a nondestructive and efficient method of μCP to perform "click" reactions on alkyne-terminated, oxide-free silicon surfaces for the first time. For the sample printed with a featured PDMS stamp, LAPS imaging showed a good agreement with the pattern of the PDMS stamp, indicating the successful chemical patterning on non-oxidized silicon and SOS substrates and the capability of LAPS to image the molecular patterns with high sensitivity.

Chemistry,Engineering,Medicine,Materials Science
Method for fabrication of paper-based microfluidic devices by alkylsilane self-assembling and UV/O3-patterning.

Qiaohong He,Cuicui Ma,Xianqiao Hu,Hengwu Chen

DOI: https://doi.org/10.1021/ac303138x

IF: 7.4

2013-01-01

Analytical Chemistry

Abstract:This work presents a novel and facile method for fabricating paper-based microfluidic devices by means of coupling of hydrophobic silane to paper fibers followed by deep UV-lithography. After filter paper being simply immersed in an octadecyltrichlorosilane (OTS) solution in n-hexane for 5 min, the hydrophilic paper became highly hydrophobic (water contact angle of about 125 degrees) due to the hydrophobic OTS molecules were coupled to paper's cellulose fibers. The hydrophobized paper was then exposed to deep UV-lights through a quartz mask that had the pattern of the to-be-prepared channel network Thus, the UV-exposed regions turned highly hydrophilic whereas the masked regions remained highly hydrophobic, generating hydrophilic channels, reservoirs and reaction zones that were well-defined by the hydrophobic regions. The resolution for hydrophilic channels was 233 +/- 30 mu m and that for between-channel hydrophobic barrier was 137 +/- 21 mu m. Contact angle measurement, X-ray photoelectron spectroscopy (XPS) and attenuated total reflectance Fourier transform-infrared (ATR-FT-IR) spectroscopy were employed to characterize the surface chemistry of the OTS-coated and UV/O-3-treated paper, and the related mechanism was discussed. Colorimetric assays of nitrite are demonstrated with the developed paper-based microfluidic devices.
Photopatterning of self-assembled monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

Shuqing Sun,Karen S L Chong,Graham J Leggett

DOI: https://doi.org/10.1088/0957-4484/16/9/065

IF: 3.5

2005-01-01

Nanotechnology

Abstract:Self-assembled monolayers (SAMs) of alkanethiols have been patterned on micrometre and nanometre length scales by exposure to light from a frequency doubled argon ion laser. Friction force microscopy shows that the patterning speed depends on the nature of the terminal group and is in the order COOH > CH3, the reverse of the order reported previously using a mercury arc lamp, indicating that a different photo-oxidation mechanism is responsible. It is suggested that this involves the creation of hot electrons at the gold surface that initiate oxidation of the adsorbate. Nanostructures have been fabricated using scanning near-field photolithography (SNP), in which the UV laser is coupled to a near-field scanning optical microscope. During SNP, the rates of writing required for complete oxidation correlate closely with oxidation rates measured during micropatterning, suggesting that the mechanism is essentially the same. SAMs on silver have been patterned, yielding linewidths smaller than 50 nm. The selective alkylation of hydrogen passivated Si has been demonstrated, yielding structures that may be used as resists for etching and demonstrating a powerful new capability-fluid-phase nanophotolithography. Patterned SAMs prepared using SNP have been used to selectively attach polymer nanoparticles, demonstrating their utility for the creation of functional molecular nanostructures. Nanopatterns generated by SNP have also been used as resists, enabling the etching of nanostructures into gold and the fabrication of three-dimensional nanostructures in silicon using a two-stage wet etch process.
Micro-patterning of 3-aminopropyltrimethoxy- silane self-assembled monolayers with colloidal gold

Junfu Liu,Lingang Zhang,Ning Gu,Qingyue Hong,Jiyun Ren,Yanpeng Wu,Pansong Mao,Deying Chen,Zuhong Lu

DOI: https://doi.org/10.1016/S0968-5677(98)00108-4

1998-01-01

Supramolecular Science

Abstract:This paper provides a new method to the micro-patterning of 3-aminopropyl-trimethoxysilane (ATS) self-assembled monolayers by colloidal Au. Photolithographing of ATS self-assembled monolayers on SiO2-coated Si substrates and subsequent assembly of colloidal Au to the amino terminal groups in the unirradiated regions lead to the formation of Au microstructures. As revealed by scanning electron microscopy, the colloidal Au closely replicates the mask patterns on the unirradiated regions. The present approach may be applicable to fabrication of microelectronic circuits and microbiosensors.
[Serological studies in the diagnosis of Q fever in persons in professional contact with cattle and sheep].

E. Mikolajczyk,Z. Lewinska,Z. Dąbrowski

Przeglad Epidemiologiczny

Abstract:
Mesoscale Protein Patterning on a Self-Assembled Monolayer Coated Silicon Surface Through Nanosphere Lithography

Andrew Schlereth,Panae Noomuna,Pei Gao

DOI: https://doi.org/10.3866/pku.whxb201701032

2017-01-01

Abstract:The patterning and immobilization of protein molecules onto functionalized silicon substrate through surface silane chemistry is of interest because protein patterning is an important prerequisite for the development of protein-based diagnostics in biological and medicinal fields. As a model system, mesoscale netty lysozyme arrays were assembled on oxidized undecyltrichlorosilane (UTSox) monolayer coated silicon surface through nanosphere lithography. The size of the arrays ranged from nanometer to micrometer can be easily adjusted by changing the size of nanospheres applied on the surface. By using nanosphere lithography, we are capable of fabricating a regular array of protein islands over centimeter sample regions. The created lysozyme protein patterns were characterized by atomic force microscopy (AFM) and fluorescence microscope, respectively. The analysis has demonstrated that this newly established approach offers a faster and more reliable process to fabricate netty protein arrays over large areas compared to conventional scanning-probe based fabrication methods. Furthermore, the carboxylic acid-terminated layer on surfaces is particularly effective for immobilizing protein molecules through either electrostatic interactions or covalent attachment via imine bonds. Therefore, the negative-toned protein structure on the surface with carboxylic acid groups coated on the bare areas makes it possible to fabricate two types of protein molecules on one surface.
Preparation and Photolithography of Self-Assembled Monolayers of 10-Mercaptodecanylphosphonic Acid on Glass Mediated by Zirconium for Protein Patterning.

Xuemingyue Han,Shuqing Sun,Tao He

DOI: https://doi.org/10.1016/j.colsurfb.2013.02.030

IF: 5.999

2013-01-01

Colloids and Surfaces B Biointerfaces

Abstract:Self-assembled monolayers (SAMs) formed by adsorption of octadecylphosphonic acid (ODPA) on zirconium mediated glass substrates were prepared. In this sandwich structure, Zr4+ was used as a bi-linker to bind phosphonic acid head group in ODPA to glass substrates. The contact angle of the as-prepared SAMs was measured to be around 104°. X-ray photoelectron spectroscopy (XPS) characterization indicated the modification of Zr4+ on glass substrates was critical for the formation of reasonably dense, well-ordered SAMs similar in quality to those typically formed on other metal oxide surfaces. Bifunctional molecule, 10-mercaptodecanylphosphonic acid (MDPA), bearing thiol terminal groups for various chemical reactions, was synthesized and formed SAMs on glass using the same approach, which allowed us to control the surface chemistry and functionality through photooxidation of the thiol terminal group. Photopatterning of proteins was performed first by exposing the SAMs to UV light through a mask, followed by protein immobilization to the masked regions through a heterobifunctional linker, while the exposed areas prohibit nonspecific protein absorption. The present strategy, which combined the SAMs assembly and photolithography, offered a facile approach for the fabrication of biomolecule patterning and could be applied to construction of biochips and other applications.
Growth and organization of (3-Trimethoxysilylpropyl) diethylenetriamine within reactive amino-terminated self-assembled monolayer on silica

Yannick Dufil,Virginie Gadenne,Pascal Carrière,Jean-Michel Nunzi,Lionel Patrone

DOI: https://doi.org/10.48550/arXiv.2012.05523

2020-12-10

Materials Science

Abstract:Alkane chains are the most commonly used molecules for monolayer fabrication. Long chains are used for their strong van der Waals interactions inducing good layer organization. Amine function-terminated alkyl chains are of great interest and are widely used for further surface functionalization. Since it is mandatory that such layers be organized to provide amine moieties at the surface, the present study deals with exploring amine-terminated SAM formation as an alternative to the usual aminopropylalkylsilane SAM. Additionally, using a long NH2terminated alkyl chain allows the formation of hydrogen bonding thanks to the two NH moieties born along the chain. Furthermore, such hydrogen bonding makes possible to shorten the molecule length while preserving a well-organized monolayer. For this purpose we performed a complete study of the grafting of (3-Trimethoxysilylpropyl) diethylenetriamine (DETAS) on native silicon oxide using various solvents, relative humidity and temperature values. Grafting kinetics was monitored by ellipsometry and goniometry, and SAM structure and organization using AFM and ATR-FTIR spectroscopy. Hydrogen bonding was evidenced within the SAM growth process and in the final complete SAM. We believe such study enables a better control of good quality DETAS SAM in order to improve their efficiency in further surface functionalization applications.

Pulmonary arteriosclerosis produced by hyperoxemic normotensive perfusion.

Patterning of Supported Gold Monolayers Via Chemical Lift-off Lithography

Controlled Grafting of Well-Defined Polymers on Hydrogen-Terminated Silicon Substrates by Surface-Initiated Atom Transfer Radical Polymerization

Chemical Modification on Top of Nanotopography to Enhance Surface Properties of PDMS

Vesicle Array-Templated Large-Area Silica Surface Patterns

Designing mamdani type fuzzy rule using a collaborative FCM scheme

Digoxin radioimmunoassay: Capabilities and limitations

Synthesis of polymer-silica hybrid microparticles with defined geometry using surface initiated atom transfer radical polymerization

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

Micropatterned Charge Heterogeneities via Vapor Deposition of Aminosilanes

Spatial resolution in thin film deposition on silicon surfaces by combining silylation and UV/ozonolysis

XPS and AFM Characterization of the Self‐assembled Molecular Monolayers of a 3‐aminopropyltrimethoxysilane on Silicon Surface, and Effects of Substrate Pretreatment by UV‐irradiation

Solid-Phase Microcontact Printing for Precise Patterning of Rough Surfaces: Using Polymer-Tethered Elastomeric Stamps for the Transfer of Reactive Silanes

"Click" Patterning of Self-Assembled Monolayers on Hydrogen-Terminated Silicon Surfaces and Their Characterization Using Light-Addressable Potentiometric Sensors.

Method for fabrication of paper-based microfluidic devices by alkylsilane self-assembling and UV/O3-patterning.

Photopatterning of self-assembled monolayers at 244 nm and applications to the fabrication of functional microstructures and nanostructures

Micro-patterning of 3-aminopropyltrimethoxy- silane self-assembled monolayers with colloidal gold

[Serological studies in the diagnosis of Q fever in persons in professional contact with cattle and sheep].

Mesoscale Protein Patterning on a Self-Assembled Monolayer Coated Silicon Surface Through Nanosphere Lithography

Preparation and Photolithography of Self-Assembled Monolayers of 10-Mercaptodecanylphosphonic Acid on Glass Mediated by Zirconium for Protein Patterning.

Growth and organization of (3-Trimethoxysilylpropyl) diethylenetriamine within reactive amino-terminated self-assembled monolayer on silica