Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

Effect of Organic Pollution on Surface Quality and Laser Damage in Fused Silica

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Investigation of the Multimechanism Laser Cleaning Dynamics for Rough Fused Silica Surfaces with Organic Contaminants: A Computational Simulation and Atomic Analysis.

Effects of fused silica surface roughness on the interfacial adsorption mechanism of contaminant

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Improve the Laser Damage Resistance of Fused Silica by Wet Surface Cleaning and Optimized HF Etch Process

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Influence of Organic Solvents on Fused Silica Components with Different High Transmission Films

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica

Analysis and Experimental Investigation of Laser Induced Damage of Optics

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Surface Molecular Structure Defects and Laser-Induced Damage Threshold of Fused Silica During a Manufacturing Process

Damage Behaviors of Silica Microparticles on Fused Silica Optics under 355 Nm High Fluence Laser

Effect on Nanoscale Damage Precursors of Fused Silica with Wet Etching in KOH Solutions

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Effects of Acid-Etching Depth on 355 Nm Laser-Induced Damage Threshold of Fused Silica

Effect of HF etching on the surface quality and laser-induced damage of fused silica

Detailed Near-Surface Nanoscale Damage Precursor Measurement and Characterization of Fused Silica Optics Assisted by Ion Beam Etching

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics