Manipulation of Bilayer Mos2-Based Mesfet with Flexoelectric Polarization Field

Junjie Wu,Chuwei Wu,Weisheng Zhang,Chunli Zhang,Weiqiu Chen
DOI: https://doi.org/10.1016/j.nanoen.2024.109415
IF: 17.6
2024-01-01
Nano Energy
Abstract:We propose a bilayer MoS2-based metal-semiconductor field-effect transistor (MESFET) with the characteristic of mechanical modulation of its performance through flexoelectricity. The MESFET sample is fabricated with the bilayer MoS2 and the Si/SiO2 substrate as well as the gate electrode of Pt and the source/drain electrode of Ag/ Au. The current-voltage relationships of the fabricated MESFET under the action of different gate voltages and tip forces as well as their combinations are measured with AFM. The tip force produces a strain gradient induced flexoelectric polarization field and thus changes the effective barrier height of Schottky contact. As a result, it can serve as an equivalent gate voltage, playing a significant tuning role in the performance such as transconductance and carrier mobility of the proposed MESFET. Within the drain -source voltage (VDS) range of 0-2 V, the maximum carrier mobility of the fabricated MESFET under the combined action of traditional gate voltage (VGS) and tip force reach 470 cm 2/(V center dot s) significantly higher than that under VGS alone. The study provides valuable insights into the application of flexoelectricity in MESFET devices based on two-dimensional materials.
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