Microstructure and In-Situ Growth Process of Insulating Films on TiNi Shape Memory Alloys

Fushun Liu,Shengkai Gong,Huibin Xu

2001-01-01

Abstract:TiO 2 insulating films were grown by in situ hydrothermal chemistry technique. The growth process, morphology and microstructure of the films were investigated systematically. The results show that such films are mainly composed of TiO 2 and TiO 2- x ( x ≤0.2), with a maximal thickness of 4～5?μm. The optimal fabrication process of this growth technique is found to heat the shape memory alloys with the reaction liquid to 200?℃ for 8～12?h. Cracks have been found in the films when the holding time exceeded 16?h. The resistance increases with the holding time and has a maximum value of about 8.33×10 5?Ω after hold at 200?℃ for 12?h.