Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Formation of Anti-Etching Nanopatterns in Field-Emission Scanning Probe Lithography on Calixarene Films

Polymer Pen Chemical Lift-Off Lithography

Scanning probe lithography on calixarene towards single-digit nanometer fabrication

Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns

Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenylsiloxane monolayers.

Fabrication of silicon-based multilevel nanostructures via scanning probe oxidation and anisotropic wet etching

SF₆ Optimized O₂ Plasma Etching of Parylene C.

A strategy to fabricate nanostructures with sub-nanometer line edge roughness

Unconventional Lithography for Patterned Nanomaterials

A process study of electron beam nano-lithography and deep etching with an ICP system

Applications of Scanning Probe Microscopy in Nanolithography on Alkanethiol Self-Assembled Monolayers

Process Research of Novel Electron Beam Lithography Resist Calixarene Used in Nanofabrication

Spatial patterning of colloidal nanoparticle-based thin film by a combinative technique of layer-by-layer self-assembly and lithography

Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

Inductively Coupled Plasma etching of amorphous silicon nanostructures over nanotopography using C4F8/SF6 chemistry

Morphology Control and Electron Field Emission Properties of High-Ordered Si Nanoarrays Fabricated by Modified Nanosphere Lithography

Sub 20 nm Silicon Patterning and Metal Lift-Off Using Thermal Scanning Probe Lithography

New Colloidal Lithographic Nanopatterns Fabricated by Combining Pre-Heating and Reactive Ion Etching

A New Strategy of Lithography Based on Phase Separation of Polymer Blends

Quantitative evaluation of residual resist in electron beam lithography based on scanning electron microscopy imaging and thresholding segmentation algorithm

Scanning Probe Lithography: State-of-the-Art and Future Perspectives