Dual-Float-Gate Capacitor for Low-Voltage Multi-Level Nonvolatile Memory with Enhanced Retention

Haixia Li,Hongxu Liao,Baotong Zhang,Ran Bi,Ru Huang,Ming Li
DOI: https://doi.org/10.1109/edtm55494.2023.10103085
2023-01-01
Abstract:Low-voltage multi-level non-volatile memory has been extensively desired to satisfy the need of the data center and neuromorphic artificial intelligent computing. In this work, n-Si/Al2O3/TiN/Al2O3/TiN/Al2O3/TiN stack is proposed to represent the potential of low-voltage multi-level memory and neuromorphic computing application. It features dual metal float-gate layers to achieve low-voltage multilevel storage at V-p=-5 V and enhanced long-term high-temperature retention (10(4) s) at 85 degrees C.
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