Abstract:Metal cone-shaped nanotip field-electron emitters which are fabricated by directional thin-film deposition (so-called Spindt-type tips) have shown promising potential for application in modern vacuum micro-/nanoelectronics. Although the fabrication processes of Spindt-type tips have been well established, the in situ release of the initial stress in the deposited metal thin film is still an open issue. Herein, an in situ stress-release process was developed to fabricate chromium (Cr) tip arrays. Patterned photoresist microcavities with surrounding trenches were designed. The microcavities were used as templates for forming the metal tips. Trenches were employed for the in situ internal stress release of the Cr film on the top of the resist. The trenches not only separated the deposited Cr film into small-sized slices (square film on the photoresist) for decreasing the deformation but also provided sufficient space for possible deformation. High-aspect-ratio (similar to 2) tips were achieved by plasma etching the Si substrate using the Cr tip as the mask, forming a Cr tip on a Si pillar. The Cr tips maintaining a good tip shape demonstrated that the Cr nanotips possessed good etch resistance to the SF6/O2 plasma. The gated Cr-tip array was fabricated following a self-aligned microfabrication procedure. The fabrication process was compatible with the semiconductor manufacturing technology. The gated devices showed an emission current of 33 mu A at a gate voltage of 137 V. This work provides a well-developed in situ stress-releasing fabrication process to obtain Spindt-type Cr-tip field -electron emitters, which has potential for application in ionization vacuum gauges and neutralizers for propulsion.

Fabrication of Spindt-Type Nanometer-Sized Chromium Tips for Application As Field-Electron Emitters by Releasing the Stress of the Deposited Thin Film

Fabrication and Characterization of Gated Carbon Nanotube Emitters in A Trench Structure

B13-P-03 Fabrication and Characterization of Silicon Field Emission Tips for Miniature Field Emission Electron Microscope

Fabrication of Carbon Nanotube Lateral Field Emitters

Field electron emission from ultra-high density Si nanotip arrays

Field Emission Tip Array Fabrication Utilizing Geometrical Hindrance in the Oxidation of Si

Efficient Fabrication of Carbon Nanotube Micro Tip Arrays by Tailoring Cross-Stacked Carbon Nanotube Sheets.

Fabrication and field emission property of a Si nanotip array

Nanoscale-Patterned Cr Films by Selective Etching Using a Heat-Mode Resist: Implications for X-ray Beam Splitter

Controlled growth of SiC flexible field emitters with clear and sharp tips

Fabrication And Field Emission Study Of Atomically Sharp High-Density Tungsten Nanotip Arrays

Fabrication of Single Crystal Al Nanowire Array by Stress-induced Atomic Diffusion for Development of Transparent Conductive Film

Micro Electrochemical Fabrication Of Tungsten Tips For Field Emission Electric Propulsion Thruster

P-Type Si-Tips With Integrated Nanochannels for Stable Nonsaturated High Current Density Field Electron Emission

Si Tip with Integrated Nano-Channel: Self-heated and Self-Current-limited Field Electron Emitter

10.5: Field emission properties of atomically sharp tungsten nanotip arrays fabricated by a novel nanocasting method

Fabrication of cantilever arrays with nano-aperture hollow tips for parallel microplasma etching

Self-modulated Field Electron Emitter: Gated Device of Integrated Si Tip-on-nano-channel

High Current Field Emission from Individual Non-Linear Resistor Ballasted Carbon Nanotube Cluster Array

Experimental Studies on Field Emission Characteristic of Graphite

Sputtering of Spindt-type Field Emission Tip Induced by Electron Stimulated Desorption of Gate Contaminations