Micro/nano moire methods

Anand K. Asundi,Haixia Shang,Huimin Xie,Biao Li
DOI: https://doi.org/10.1117/12.500902
2003-01-01
Abstract:Two novel micro/nano moire method, SEM scanning moire and AFM scanning moire techniques are discussed in this paper. The principle and applications of two scanning moire methods are described in detail. The residual deformation in a polysilicon MEMS cantilever structure with a 5000 lines/mm grating after removing the SiO2 sacrificial layer is accurately measured by SEM scanning moire method. While AFM scanning moire method is used to detect thermal deformation of electronic package components, and formation of nano-moire on a freshly cleaved mica crystal. Experimental results demonstrate the feasibility of these two moire methods, and also show they are effective methods to measure the deformation from micron to nano-scales.
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