Abstract:Optical metrology is widely used to characterize surface deformations due to the noncontact, full-field, and highly accurate nature of the measurements. In combination with advanced microscopes, optical metrology methods have recently been extended into the microand nanoscales. In measurements that use the moiré (beat pattern produced between gratings of initially equal spacing) method,1–3 gratings act as sensors that record the original deformation of a specimen. Precise preparation of the gratings is therefore required to ensure accurate measurements. Existing technologies for grating fabrication do not meet all the necessary requirements (i.e., production of high-frequency and large-area gratings at low cost) simultaneously. Ordinary photolithography, due to its diffraction limitation, can generally only produce gratings with hundreds of lines per millimeter. Holographic lithography can be used to make gratings with frequencies of up to 4800 lines per millimeter, but there are strict requirements on the optical system and the alignment techniques. Electron beam lithography and focused ion beam lithography can produce fine gratings with up to 10,000 lines per millimeter, but the grating area is very small (micrometer scale).4, 5 We have developed a new moiré grating fabrication method that is based on the nanoimprint lithography (NIL) technique.6 NIL creates nanoscale patterns through mechanical deformation and has low costs, high throughput, and high resolution. This process has already been used in several microelectronic engineering, optical engineering, and bioengineering applications. Our technique can be used to produce gratings with large areas and high frequencies on different specimens, and at fast rates (see Figure 1).7–9 The preparation of the stamp that is used for imprinting is a key issue in our method. When imprinting is conducted at low pressure, a full-contact condition (between the specimen and Figure 1. (a) Grating fabricated on a traditional (millimeter-scale dimensions) specimen (1200 lines per millimeter, cross type).7 (b) Grating fabricated on a thin (<1 m) film specimen (1200 lines per millimeter, cross type).8

Electron moiré method and its application to micro-deformation measurement

Fabrication of Micro-Moiré Gratings on a Strain Sensor Structure for Deformation Analysis with Micro-Moiré Technique

Micro-moiré methods with high resolution microscopes and their applications

High-Frequency Deformation Grating Fabrication Techniques and Applications

Thermal Deformation Measurement of the Solder Joints in Electronic Packages Using Electron Moiré Method

Fabrication of high-frequency electron beam moiré grating using multi-deposited layer techniques

Micro/nano Moiré methods

Study of Moiré Grating Fabrication on Metal Samples Using Nanoimprint Lithography

Micro/Nano Grating and Its Application to Moire Measurement

Micro/nano moire methods

Afm Scanning Moire Method For Nano-Deformation Measurement

High Resolution AFM Scanning Moiré Method and Its Application to the Micro-Deformation in the BGA Electronic Package

Thermal Deformation Measurement of Electronic Package Using Advanced Moire Methods

In-plane deformation measurement using the atomic force microscope moiré method

High-resolution Micro-Moire Methods: Principles and Applications

The Technique for Fabricating Submicron Moiré Grating Using FIB Milling

Residual thermo-creep deformation of copper interconnects by phase-shifting SEM Moiré method

Experimental study on nanometer moire method

Large-deformation analysis in microscopic area using micro-moiré methods with a focused ion beam milling grating

Fabrication of High-Density Moiré Gratings