Abstract:Optical metrology is widely used to characterize surface deformations due to the noncontact, full-field, and highly accurate nature of the measurements. In combination with advanced microscopes, optical metrology methods have recently been extended into the microand nanoscales. In measurements that use the moiré (beat pattern produced between gratings of initially equal spacing) method,1–3 gratings act as sensors that record the original deformation of a specimen. Precise preparation of the gratings is therefore required to ensure accurate measurements. Existing technologies for grating fabrication do not meet all the necessary requirements (i.e., production of high-frequency and large-area gratings at low cost) simultaneously. Ordinary photolithography, due to its diffraction limitation, can generally only produce gratings with hundreds of lines per millimeter. Holographic lithography can be used to make gratings with frequencies of up to 4800 lines per millimeter, but there are strict requirements on the optical system and the alignment techniques. Electron beam lithography and focused ion beam lithography can produce fine gratings with up to 10,000 lines per millimeter, but the grating area is very small (micrometer scale).4, 5 We have developed a new moiré grating fabrication method that is based on the nanoimprint lithography (NIL) technique.6 NIL creates nanoscale patterns through mechanical deformation and has low costs, high throughput, and high resolution. This process has already been used in several microelectronic engineering, optical engineering, and bioengineering applications. Our technique can be used to produce gratings with large areas and high frequencies on different specimens, and at fast rates (see Figure 1).7–9 The preparation of the stamp that is used for imprinting is a key issue in our method. When imprinting is conducted at low pressure, a full-contact condition (between the specimen and Figure 1. (a) Grating fabricated on a traditional (millimeter-scale dimensions) specimen (1200 lines per millimeter, cross type).7 (b) Grating fabricated on a thin (<1 m) film specimen (1200 lines per millimeter, cross type).8

Fabrication of high-frequency electron beam moiré grating using multi-deposited layer techniques

Fabrication Of High Temperature Moire Grating And Its Application

A New Moiré Grating Fabrication Technique Using Hot Embossing Lithography

Fabrication of High-Density Moiré Gratings

Fabrication of high-frequency moiré gratings for microscopic deformation measurement using focused ion beam milling

Development of the Technique for Fabricating Submicron Moiré Gratings on Metal Materials Using Focused Ion Beam Milling

The Technique for Fabricating Submicron Moiré Grating Using FIB Milling

Study of Moiré Grating Fabrication on Metal Samples Using Nanoimprint Lithography

A study on the production of 950°C moiré gratings in metal materials

High-Frequency Deformation Grating Fabrication Techniques and Applications

Fabrication of Micro-Moiré Gratings on a Strain Sensor Structure for Deformation Analysis with Micro-Moiré Technique

Fabrication Sub-Micron Gratings Based on Embossing

Technique of Nano-Grating Fabricated by AFM

Fabrication of the Freestanding Moire Gratings for Soft X-ray Deflectometry

Fabrication of Double-Grooved Gratings Using Coplanar Multibeam Holographic Lithography with a Phase Mask

Fabrication of High Temperature Grating on Thermal Barrier Coatings Based on Solute-Solvent Separation Soft Lithography

Fabrication Technique of Nano-Grating Using Afm

Nano-Grating Fabrication Technique

High Resolution Photolithography with Sub-Wavelength Grating

Large Area, 38 Nm Half-Pitch Grating Fabrication by Using Atomic Spacer Lithography from Aluminum Wire Grids

Fabrication of High-Aspect-ratio and High-Density X-ray Transmission Grating