Abstract:Hydrogenated amorphous silicon alloy films are generally deposited by radio frequency plasma enhanced chemical vapor deposition (RF PECVD) technique on various types of substrates. Generally it is assumed that film quality remains unchanged when deposited on textured or non-textured substrates. Here we analyzed the difference in growth of thin film silicon layers when deposited in a textured and a non-textured surface. In this investigation characteristics of two solar cells were compared, where one cell was prepared on a textured surface ( Cell-A) while the other prepared on a non-textured surface (Cell-B). Defect analysis of the devices were carried out by simulation and device modeling. It shows that the intrinsic film deposited on a textured surface was more defective ($2.4\times 10^{17}$ cm$^{-3}$) than that deposited on a flat surface ($3.2\times 10^{16}$ cm$^{-3}$). Although the primary differences in these two cells were thickness of the active layer and nature of surface texturing, the simulation results show that thin film deposited on a textured surface may acquire an increased defect density than that deposited on a flat surface. Lower effective flux density of $SiH_{3}$ precursors on the textured surface can be one of the reasons for higher defect density in the film deposited on textured surface. An Improved light coupling can be achieved by using a thinner doped window layer. By changing the thickness from 15 nm to 3 nm, the short circuit current density increased from 16.4 mA/cm$^{2}$ to 20.96 mA/cm$^{2}$ and efficiency increased from $9.4\%$ to $12.32\%$.

Growth Difference of Amorphous Silicon Between Plasma Enhanced and Catalytic Cvd Based on Silicon Heterojunction Solar Cells

Room Temperature Growth of Hydrogenated Amorphous Silicon Films by Dielectric Barrier Discharge Enhanced Cvd

Nanocrystalline‐silicon hole contact layers enabling efficiency improvement of silicon heterojunction solar cells: Impact of nanostructure evolution on solar cell performance

Optimized N-Type Amorphous Silicon Window Layers Via Hydrogen Dilution For Silicon Heterojunction Solar Cells By Catalytic Chemical Vapor Deposition

Deposition and Characterization of High-Efficiency Silicon Thin-Film Solar Cells by HF-PECVD and OES Technology

Influence of the Total Gas Flow Rate on High Rate Growth Microcrystalline Silicon Films and Solar Cells

Microcrystalline Silicon Materials and Solar Cells with High Deposition Rate

Significant Improvement of Passivation Performance by Two-Step Preparation of Amorphous Silicon Passivation Layers in Silicon Heterojunction Solar Cells*

Development of Highly Stable Hydrogenated Amorphous Silicon Films for Application in Solar Cells

Development of high conducting phosphorous doped nanocrystalline thin silicon films for silicon heterojunction solar cells application

Multiphase Structure of Hydrogenated Amorphous Silicon Carbide Thin Films

Improved Amorphous/crystalline Silicon Interface Passivation for Silicon Heterojunction Solar Cells by Hot-Wire Atomic Hydrogen During Doped A-Si:H Deposition

Improved Interface Microstructure Between Crystalline Silicon and Nanocrystalline Silicon Oxide Window Layer of Silicon Heterojunction Solar Cells

Analysis of growth of silicon thin films on textured and non-textured surface

Enhancement of Thermal Conductivity of Hydrogenated Silicon Film by Microcrystalline Structure Growth

Study of the correlation between hydrogenated amorphous silicon microstructure and crystalline silicon surface passivation in heterojunction solar cells

Improvement of amorphous silicon n-i-p solar cells by incorporating double-layer hydrogenated nanocrystalline silicon structure

Underdense A-Si:H Film Capped by A Dense Film As the Passivation Layer of A Silicon Heterojunction Solar Cell

Study on the Growth Mechanism and Microstructure of High Rate Growth Μc-Si:H Thin Films

Comparison of crystalline-silicon/amorphous-silicon interface prepared by plasma enhanced chemical vapor deposition and catalytic chemical vapor deposition

DEVELOPMENT AND RESEARCH PROGRESS IN AMORPHOUS SILICON THIN-FILM SOLAR CELLS