Hafnium Oxide‐Based Ferroelectric Devices for Computing‐in‐Memory Applications

Pei-Yao Chen,Zheng-Yu He,Ming-Yang Cha,Hao Liu,Hao Zhu,Lin Chen,Qing-Qing Sun,Shi-Jin Ding,David Wei Zhang
DOI: https://doi.org/10.1002/pssa.202000635
2021-01-01
physica status solidi (a)
Abstract:Herein, a layer of 10 nm ferroelectric Al‐doped HfO2 (HAO) film is fabricated and optimized and is further integrated in a nonvolatile memory device with TiN/HAO/Pt/Ti capacitor structure. Long retention, high endurance, and stable storage characteristics, as well as a competitive residual polarization of 2Pr = 24–30 μC cm−2 are achieved. Furthermore, computing‐in‐memory applications are implemented utilizing the HAO‐based ferroelectric memory devices. Typical NOR and NOT logic gates are obtained based on the memristor‐aided logic (MAGIC) operations by exploiting the polarization inversion characteristics of the device, which show great potential in realizing other basic Boolean logic operations. The results show that the HAO‐based ferroelectric memory device is a strong candidate in the pursuit of next‐generation parallel storage and computing systems.
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