Photoelectric In-memory Logic and Computing Achieved in HfO2-based Ferroelectric Optoelectronic Memcapacitors

Ning Liu,Jiuren Zhou,Siying Zheng,Faxin Jin,Cizhe Fang,Bing Chen,Yan Liu,Yue Hao,Genquan Han
DOI: https://doi.org/10.1109/led.2024.3400990
IF: 4.8157
2024-01-01
IEEE Electron Device Letters
Abstract:We experimentally reported the photoelectric in-memory logic and computing capabilities of HfO2-based ferroelectric optoelectronic memcapacitors (FOMs). By optimizing the annealing process at 600 °C, we achieve a robust noise margin and a substantial photoelectric memory window exceeding 9 fF/μm 2 , accompanied by an exceptionally low static energy cost below an attojoule per operation. Subsequently, our FOMs gained the capability for reconfigurable photoelectric in-memory Boolean logics of “NAND/NOT” and neuromorphic computing-based hand-written digit image recognition with an accuracy of 92%. These results signify a significant advancement towards energy-efficient sensing-memory-computing electronics, promising next-generation applications in pattern recognition, machine vision, and beyond.
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