Influence Of Preparation Parameter On Microstructure Of Mo-Mosi2 Gradient Layer Section

Yungang Li,Shixian Zhang,Ruixin Ma,Zhihui Li
2010-01-01
Abstract:Mo-MoSi2 gradient layer was made by ihrigizing, on Mo basal body, using the silicon electrodeposited in KCl-NaCl-NaF-SiO2 system as silicon source. The influence of preparation parameter on microstructure of gradient layer section was investigated. The results showed that microstructures of gradient layer section made by the method are most columnar crystals and the columnar grain size changes with preparation parameter. The grain size enlarges with current density increasing. When the pulse parameter t(1)/t(2) increases or the pulse parameter D decreases, the grain size enlarges. The grain size hardly change with temperature. By diffusing heat treatment, the microstructure of the gradient layer can change from being columnar crystal to other crystal, new diffusing layer is generated between basal body Mo and the gradient layer and the thickness of new gradient layer is increased.
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