Preparation of Al-20Si Functionally Gradient Materials under Pulsed Magnetic Field

Jun Wang,Quan Zhou,Han Wu,Shiping Hu,Feng Liu
DOI: https://doi.org/10.15980/j.tzzz.2018.02.029
2018-01-01
Abstract:Al-20Si functionally gradient materials under pulsed magnetic field was fabricted.Effects of pulse voltage,pulse frequency,mold temperature and pouring temperature on the morphology and distribution of primary silicon in the Al-20Si gradient alloy were investigated.The results reveal that Al-20Si functionally gradient material can be prepared successfully by pulsed magnetic field.Primary silicon is segregated in the edge,and it is absent in the center position.In the range of 0~150 V,with the increase of the pulse voltage,morphology of primary silicon is changed from small blocks to large lath shape,and the average distribution width is decreased gradually.In the range of 1~10 Hz,the average distribution width of primary silicon is decreased with the increase of pulse frequency.When the pouring temperature is at 690~780 ℃ or mold temperature is at 400~700 ℃,with the increase of pouring temperature or mold temperature,the average width of primary silicon is decreased at first and then increased.
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