Simulation Of Source-To-Drain (S/D) Tunneling In Sub-10nm Dg Mosfets With Wkb Method

B Jiang,Dw Zhang,Qt Zheng,Ll Tian,Zp Yu
2003-01-01
Abstract:As the gate length of MOSFETs keeps sealed down, source-to-drain (S/D) tunneling current becomes significant. S/D tunneling current is simulated in dais work using WKB method, and is based on the quantum ballistic transport model. The dependence of the S/D tunneling current on channel length and silicon film thickness is examined. It is shown that with channel length as small as 6nm, only extremely thin silicon film (thickness of 1nm) can deliver good device characteristics. Comparison to NEGF simulation confirms the validity of the proposed approach.
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