A Full-region Model for Ultra-Scaled MoS<inf>2</inf> MOSFET Covering Direct Source-Drain Tunneling

Weiran Cai,Wenrui Lan,Zichao Ma,Lining Zhang,Mansun Chan
DOI: https://doi.org/10.1109/ISNE48910.2021.9493621
2021-01-01
Abstract:A full-region model for ultra-scaled monolayer MoS <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> MOSFETs is reported in this work. The electrostatic potential in the scaled transistor structure is analyzed based on a first-principle verified potential model. A continuous full region current model is then developed to capture the short channel effects. Based on the potential model, the barrier height and width for direct source-drain tunneling are obtained. The direct tunneling module reproduces the essential physics observed from numerical device simulations. After integration with the thermionic emission model, the full-region current model is implemented into a SPICE simulator and the model convergence is verified by simulating typical circuits.
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