Monolithic Optical Microlithography of High-Density Elastic Circuits

Yu-Qing Zheng,Yuxin Liu,Donglai Zhong,Shayla Nikzad,Shuhan Liu,Zhiao Yu,Deyu Lw,Hung-Chin Wu,Chenxin Zhu,Jinxing Li,Helen Tran,Jeffrey B-H Tok,Zhenan Bao
DOI: https://doi.org/10.1126/science.abh3551
IF: 56.9
2021-01-01
Science
Abstract:Polymeric electronic materials have enabled soft and stretchable electronics. However, the lack of a universal micro/nanofabrication method for skin-like and elastic circuits results in low device density and limited parallel signal recording and processing ability relative to silicon-based devices. We present a monolithic optical microlithographic process that directly micropatterns a set of elastic electronic materials by sequential ultraviolet light-triggered solubility modulation. We fabricated transistors with channel lengths of 2 micrometers at a density of 42,000 transistors per square centimeter. We fabricated elastic circuits including an XOR gate and a half adder, both of which are essential components for an arithmetic logic unit. Our process offers a route to realize wafer-level fabrication of complex, high-density, and multilayered elastic circuits with performance rivaling that of their rigid counterparts.
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