Study on Polishing Process of CdSe Wave Plate under Acidic Conditions

Shun-yong WEI,Zhi-yong ZHANG,Hui YANG,Xin-you AN,Min ZHANG,Ti-xian ZENG
DOI: https://doi.org/10.3969/j.issn.1000-985X.2018.06.033
2018-01-01
Abstract:The orientation of large-size CdSe crystal grown by the vapor sublimation method, was determined by natural cleavage and X-ray diffract meter.The embryo of CdSe wave plates with size of 20 mm×20 mm×3 mm were cut in the direction of the optical axis.The surface treatment of the wave plate was treated by acid chemical mechanical polishing.The slurry was 5%bromine methanol and W0.25 ( the particle size is 0.25 μm) diamond suspension press 1 :10 the volume ratio of the mixture, its pH value was adjusted by hydrochloric acid.Results show that when the pH was 5, the surface without scratches was flat, the roughness was about 0.8 nm, the parallel tolerance was 0.00275 mm, the infrared transmittance was 65%-70%in the range of 2-20 μm, and its absorption coefficient was between 0.01 cm-1 and 0.06 cm-1.
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