Study of Thermal Simulation Technology for GaN Power Devices

Huaixin GUO,Ping HAN,Tangsheng CHEN
DOI: https://doi.org/10.19623/j.cnki.rpsse.2017.03.007
2017-01-01
Abstract:In view of the bottleneck of heat dissipation in high power devices,the research on thermal analysis technology for near-junction region of GaN power chip was carried out by the finite element method.The theoretical thermal model for calculating heat dissipation capacity of near-junction region was established,the effects of theoretical modeling factors including boundary condition,initial condition,lattice thermal impact,and structural hypothesis on simulation precision were studied systemically,and the causes of the above effects were analyzed.Meanwhile,infrared thermography technique was used to determine the junction temperature of GaN chip with different power density.It is found that the deviations between calculated values and experimental data of junction temperature are all less than 10%,indicating that thermal simulation technology based on proper modeling is applicable to quantitatively evaluate the heat dissipation capacity of power devices.
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