Effect of displacement radiation damage on bipolar junction transistors under various bias conditions

Li LIU,Lei DONG,Chaoming LIU,Xingji LI,Jianqun YANG,Guoliang MA
DOI: https://doi.org/10.11805/TKYDA201705.0874
2017-01-01
Abstract:35 MeV Si ion is adopted as the irradiation source to research the displacement radiation damage and defects on NPN and PNP Bipolar Junction Transistors(BJTs) under various bias cases. The changing of electrical parameters of BJTs is in situ measured with increasing irradiation fluence of 35 MeV Si ions. By using Deep Level Transient Spectroscopy(DLTS),deep level defects in the bipolar junction transistors under various bias conditions are measured after irradiation. Based on the in situ electrical measurement and DLTS spectra,it is clearly that the bias conditions could affect the concentration of deep level defects,and the radiation damage induced by heavy ions. Different types of defects give different contributions to the electrical performance degradation. The vacancy related defects(U2(-/0) and U2(+/0)) can give more obvious contributions to the current gain degradation than other defects.
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